1994
DOI: 10.1103/physrevb.50.10886
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Surface states and reconstruction of epitaxial √3 × √3 R30° Er silicide on Si(111)

Abstract: The surface electronic structure of epitaxial &3 X &38.30 ErSi& 7 layers on Si(111)has been studied by high-resolution angle-resolved ultraviolet photoemission spectroscopy. Typical surface states or resonances are unambiguously identified and their band dispersions mapped along the high-symmetry I M, I I(, and E M lines of the (1 X 1) surface Brillouin zone. These data are compared to the band structure of two-dimensional p (1 X 1) Er silicide extensively studied in previous works. It is found that the promin… Show more

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Cited by 46 publications
(31 citation statements)
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“…For the monolayer, a metallic band structure was reported with electron pockets at the M points and rather isotropic effective masses and a hole pocket at the C point [14,15]. In the multilayer silicides, similar states were found, while zone folding effects resulted in a smaller surface Brillouin zone [16]. Recently, Fermi surface maps were presented for yttrium and gadolinium silicide monolayers on Si(1 1 1), showing first indications of anisotropic effective masses at the M points [17].…”
Section: Introductionmentioning
confidence: 80%
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“…For the monolayer, a metallic band structure was reported with electron pockets at the M points and rather isotropic effective masses and a hole pocket at the C point [14,15]. In the multilayer silicides, similar states were found, while zone folding effects resulted in a smaller surface Brillouin zone [16]. Recently, Fermi surface maps were presented for yttrium and gadolinium silicide monolayers on Si(1 1 1), showing first indications of anisotropic effective masses at the M points [17].…”
Section: Introductionmentioning
confidence: 80%
“…[16], with the exception of the effective masses around the M and C points, which are again rather anisotropic, and the observation of the second band of the monolayer silicide (yellow lines). From the series of energy surfaces in Fig.…”
Section: The Dy 3 Si 5 Multilayermentioning
confidence: 93%
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“…Silicides of the trivalent rare earth metals grown as thin films on silicon surfaces are currently of high interest because of their low Schottky-barrier heights on n-type substrates [1][2][3][4][5], their epitaxial growth on Si(1 1 1) [6][7][8][9][10][11][12][13][14][15][16][17][18] and the self-organized formation of nanowires on Si(0 0 1) [19][20][21][22][23]. These silicide films can be prepared by rare-earth deposition and subsequent annealing.…”
Section: Introductionmentioning
confidence: 99%