Applied Surface Science
 2024
DOI: 10.1016/j.apsusc.2023.158876
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Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching

Kenji Ishikawa,
Thi-Thuy-Nga Nguyen,
Yuta Aoki
et al.
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