2020
DOI: 10.1016/j.susc.2020.121637
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Surface topography and composition of NiPd alloys under oblique and normal gas cluster ion beam irradiation

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Cited by 16 publications
(5 citation statements)
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“…It is known that two competing processes are responsible for the formation of a stationary surface composition upon irradiation with atomic ions: the preferential sputtering of one of the components as a result of the development of cascades of atomic collisions, on the one hand, and radiation-induced segregation, on the other hand. Our previous experiments [16] and the results shown in Fig. 1 demonstrate that the process of preferential sputtering of alloys under irradiation with cluster ions has much in common with the case of sputtering with atomic ions.…”
Section: Composition and Topography Of The Surface Of Alloys Ni X Pd Ymentioning
confidence: 55%
See 1 more Smart Citation
“…It is known that two competing processes are responsible for the formation of a stationary surface composition upon irradiation with atomic ions: the preferential sputtering of one of the components as a result of the development of cascades of atomic collisions, on the one hand, and radiation-induced segregation, on the other hand. Our previous experiments [16] and the results shown in Fig. 1 demonstrate that the process of preferential sputtering of alloys under irradiation with cluster ions has much in common with the case of sputtering with atomic ions.…”
Section: Composition and Topography Of The Surface Of Alloys Ni X Pd Ymentioning
confidence: 55%
“…Thus, it is clear that a complete understanding of the role of preferential sputtering during formation of the surface composition of multicomponent materials upon irradiation with cluster ions has not yet been achieved. For example, we recently studied the preferential sputtering of Pd from Ni 5 Pd and NiPd alloys by argon cluster ions [16]. In the present paper, the influence of the concentrations of alloy components on the composition of its surface is studied in more details.…”
Section: Introductionmentioning
confidence: 98%
“…In the literature, it has been reported that the irradiation can lead the stoichiometric ratio of elements in the surface layer and films to change. [42][43][44] Hence, "cation-rich condition" and "anionrich condition" are considered in calculating the formation energy of different defects in this work.…”
Section: Formation Energy Of Point Defects Inmentioning
confidence: 99%
“…In the Secondary Ion Mass Specroscopy (SIMS), especially organic samples, cluster ions are used as a profiling or analyzing beam, because, unlike atomic ions, large clusters are able to separate analyte molecules from the surface with virtually no destruction of them [6,7]. In the X-ray photoelectron spectroscopy technique (XPS), cluster ions are used for surface cleaning or for depth profiling [8], although the question of selectivity of sputtering (and, consequently, changes in surface composition) of multicomponent matters remains open [9,10].…”
Section: Introductionmentioning
confidence: 99%