Surface Treatment by Atmospheric-Pressure Surfatron Jet

Hnilica, Jaroslav; Kudrle, Vít; Potočňáková, Lucia

doi:10.1109/tps.2012.2208767

Cited by 22 publications

(13 citation statements)

References 24 publications

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“…However, a synchronous temperature diagnostics during the deposition has not been performed in this investigation. Nevertheless, the characteristics of both jets regarding the neutral gas temperature have been published in the previous studies [20,36,37]. The results suggest a maximum temperature of 420 K and 320 K during the deposition for the MW and RF jet, respectively.…”

Section: On Specific Energy and Temperature Conditionsmentioning

confidence: 81%

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Schäfer

Hnilica

Šperka

et al. 2016

Surface and Coatings Technology

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a b s t r a c t a r t i c l e i n f oPlasma enhanced chemical vapor deposition (PECVD) from tetrakis(trimethylsilyloxy)silane (TTMS) has been studied at atmospheric pressure. TTMS has been chosen because of its unique 3D structure with potential to form nano-structured organosilicon polymers. Despite the widespread surveying of various silicon-organic molecules for PECVD, the use of TTMS in AP-PECVD has not been investigated deeper yet. PECVDs have been performed with two different plasma jets. While they are alike regarding the geometry and injection of TTMS, they differ in input power and excitation frequency. The radiofrequency plasma jet operates at lower power densities as compared to the microwave plasma jet. Despite this all the deposited films exhibit similar chemical properties resembling that of silicon dioxide (Si:O = 1:2) with carbon content below 5%. The films demonstrate a broad variety of morphologies from compact smooth films to nano-dendritic 3D structures depending on the particular process.

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Section: On Specific Energy and Temperature Conditionsmentioning

confidence: 81%

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Schäfer

Hnilica

Šperka

et al. 2016

Surface and Coatings Technology

View full text Add to dashboard Cite

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“…same mean power, gas flow rates, optical fibre position, etc., except the changes in AM frequency. The choice of five representative AM frequencies (CW, 80, 800, 1697 and 2459 Hz) was chosen based on our previous studies [8,16,18].…”

Section: Resultsmentioning

confidence: 99%

Time resolved optical emission spectroscopy in power modulated atmospheric pressure plasma jet

2014

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Abstract:In this paper, the effects of the power modulation on atmospheric pressure plasma jet, operated in Ar+2%N 2 mixture, are studied. Time resolved optical emission spectroscopy is used for the investigation. From line and band intensities, the excitation, vibration and rotation temperatures are calculated. Their evolution during the modulation period exhibits a strong dependence on modulation frequency. For higher modulation frequencies, there is significant discrepancy in rotational temperatures calculated from OH spectra and from N 2 + spectra, which indicates that thermalisation time can reach milliseconds.

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“…5b that the temperature inside the discharge tube is lower than the temperature in the outer region, where the amount of molecular admixture is higher. This can be caused by a gradual cascade transfer of energy from the electric field driven electrons to translations It should be noted that the actual temperature on the sample surface during plasma treatment is significantly reduced due to cooling by the compressed air [12].…”

Section: Temperature Profile From Oesmentioning

confidence: 99%

“…Plasma jets are suitable if localised plasma treatment or plasma treatment of rough or structured surfaces is needed [9,10]. Using a microwave APPJ (atmospheric pressure plasma jet) surfatron [11] it was shown [12,13] that thanks to generally higher power density, surface activation can be achieved on very short time scales. This makes plasma jets possibly competitive to DBDs even for large area processing.…”

Section: Introductionmentioning

confidence: 99%

Spatially resolved spectroscopy of an atmospheric pressure microwave plasma jet used for surface treatment

2014

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Abstract:In this study, the variations of properties of a microwave plasma jet (surfatron) along the discharge axis have been investigated using optical emission spectroscopy. As the argon jet is not enclosed, the spatial distribution of individual species in effluent plasma is the result of rather complicated interplay between energy loss and gradual mixing with the air. Spatial 2D relative intensity profiles of atomic lines and molecular bands at 310 nm, 336 nm, 391 nm and 656 nm are presented in the form of colour maps revealing different positions of maximum emission intensity for 310 nm and 336 nm (in the effluent plasma) and for 391 nm and 656 nm (inside the discharge tube). The plasma jet was used for surface treatment of heat resistant samples (stainless steel, aluminium, silicon wafer) and the effectiveness of the plasma treatment was evaluated by measuring the sessile drop contact angle, with water and glycerol as testing liquids. The optimal position for plasma treatment (close to the tube nozzle) combined with longer treatment time (10 s) lead to hydrophilic properties of samples with contact angles as low as 10°.

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Surface Treatment by Atmospheric-Pressure Surfatron Jet

Cited by 22 publications

References 24 publications

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure

Time resolved optical emission spectroscopy in power modulated atmospheric pressure plasma jet

Spatially resolved spectroscopy of an atmospheric pressure microwave plasma jet used for surface treatment

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