The work discussed in this report was supported by a Campus Fellowship LDRD. The report contains three papers that were published by the fellowship recipient and these papers form the bulk of his dissertation. They are reproduced here to satisfy LDRD reporting requirements.
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IntroductionOrganometallic vapor phase epitaxy (OMVPE) is used for fundamental research and commercial production of Ill-V electronic and optical devices. An understanding of the surface processes leads to improved control of epitaxial thin film properties and enables development of next-generation optoelectronic devices. A knowledge of the growth surface, obtained by experimental and computational means, has been helpful in exploring theories about morphological evolution, alloy composition, and ordering in a wide variety of materials systems. Surfactants are also proving to be an essential tool for engineering novel materials. The effects of surfactants such as Sb, Bi, and Te on Gap, InP, GalnP, and GaAs were studied by experiment and simulation. These surfactants were found to induce changes in surface structure, control ordering, and modify fundamental surface kinetics.Surface photo-absorption (SPA) has previously shown that the surfactant Sb, present during epitaxial growth of GalnP, modifies the surface reconstruction, induces triple-period ordering, and results in bulk composition modulation. Due to the nature of the OMVPE environment, detailed in-situ study of atomic scale growth processes is not possible. Ab-initio calculations, making use of Density Functional Theory (DFT), were performed to identify Sb induced surface reconstructions on GaP and InP (001) surfaces. A method for calculating the surface energies of these reconstructions was developed and used to create surface phase diagrams for the surfactant covered alloys. Reconstructions predicted by these phase diagrams, with (4 X 3) and (2 X 3) periodicity, explain the triple-period ordering in GalnP grown with Sb surfactant.The previously observed Sb induced composition modulation seen in GalnP indicates an increase in anisotropic adatom surface diffusion. Surfactant enhanced surface mass transport is certain to have other interesting consequences as well. To investigate this, the surfactant effects of Sb, Bi, and Te on the surface kinetics of GaAs were studied. Homoepitaxy of patterned GaAs (001) substrates was performed with increasing concentrations of surfactant. The morphological evolution of the singular surface and patterned features was studied by optical and atomic force microscopy (AFM Both Sb and Bi enhanced the [-I IO] lateral growth rate as much as 300%, while having little effect on the orthogonal direction. A kinetic Monte-Carlo simulation was used to explore the range of possible surfactant mechanisms responsible for this dramatically anisotropic evolution of the patterned features. An increase in adatom hop frequency in the [-I IO] direction was identified as the most reasonable explanation and this hypothesis was corroborated by the simulation.
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