2016
DOI: 10.1109/mmm.2015.2487898
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Surfing the Millimeter-Wave: Multilayer Photoimageable Technology for High Performance SoP Components in Systems at Millimeter-Wave and Beyond

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Cited by 14 publications
(8 citation statements)
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“…Fig. 4c illustrates the measured attenuation of SIW from 50 to 180 GHz (V, W, and D-band) for a cavity height of only 60 µm [23]. It shows a low loss of ∼0.2 dB/mm at 110 GHz and 0.75 dB/mm at 180 GHz, and also is in good agreement with the EMsimulated results of V-band and W-band SIWs shown in Fig.…”
Section: Siw Up To 180 Ghz In Advanced Multilayer Thickfilm Technologysupporting
confidence: 82%
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“…Fig. 4c illustrates the measured attenuation of SIW from 50 to 180 GHz (V, W, and D-band) for a cavity height of only 60 µm [23]. It shows a low loss of ∼0.2 dB/mm at 110 GHz and 0.75 dB/mm at 180 GHz, and also is in good agreement with the EMsimulated results of V-band and W-band SIWs shown in Fig.…”
Section: Siw Up To 180 Ghz In Advanced Multilayer Thickfilm Technologysupporting
confidence: 82%
“…Since both the dielectric and the conductor layers Table 1. The fabrication processing is straightforward, cost-effective, and yet achieves conductor widths/gaps of 10/15 μm (in place of ∼ 75/100 µm for LTCC) for realising precisely defined lumped components and other passives with remarkably high density and SRF [23]. The process can comfortably realise trench-filled continuous metal wall for mm-wave and sub-mm-wave SIW components or subsystem isolation walls (Figs.…”
Section: Some Of the Special Process Capabilitiesmentioning
confidence: 99%
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