1991
DOI: 10.2472/jsms.40.1073
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Susceptibility to Stress Corrosion Cracking of Pure Copper in NaNO2 Solutions.

Abstract: The stress corrosion cracking (SCC) of pure copper poly-and single crystals in NaNO2 solutions was investigated potentiostatically by the slow strain rate technique. The susceptibility to SCC has a maximum in 1kmol・m-3 NaNO2 solution of 7.3-7.5 pH, at the strain rate below 1.67×10-5s-1. In this solution, a close correlation was found between the SCC and anodic polarization behavior of pure copper: The potential range for SCC occurrence was 0-100mV (SCE), nearly corresponding to that of passivity/transpassivity… Show more

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“…To the best of the authors' knowledge, this is the first report on tarnish crack-type SCC occurring on pure copper in swollen bentonite without NH 3 ; however, the tarnish rupture-type SCC of copper has been reported in various environments. [15,16] The surface oxide/sulfide film mainly consisted of Cu 2 O, which was relatively compact as compared with CuO. In contrast, the particulate deposits distributed randomly on the tensile specimen surface were porous and confirmed to be composed of CuO.…”
Section: Discussionmentioning
confidence: 98%
See 1 more Smart Citation
“…To the best of the authors' knowledge, this is the first report on tarnish crack-type SCC occurring on pure copper in swollen bentonite without NH 3 ; however, the tarnish rupture-type SCC of copper has been reported in various environments. [15,16] The surface oxide/sulfide film mainly consisted of Cu 2 O, which was relatively compact as compared with CuO. In contrast, the particulate deposits distributed randomly on the tensile specimen surface were porous and confirmed to be composed of CuO.…”
Section: Discussionmentioning
confidence: 98%
“…To the best of the authors' knowledge, this is the first report on tarnish crack‐type SCC occurring on pure copper in swollen bentonite without NH 3 ; however, the tarnish rupture‐type SCC of copper has been reported in various environments. [ 15,16 ]…”
Section: Discussionmentioning
confidence: 99%