1984
DOI: 10.1063/1.95213
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Symmetry and electronic properties of the oxygen thermal donor in pulled silicon

Abstract: Oxygen is the dominant impurity in pulled silicon. At 450 °C, thermal donors form in oxygen rich silicon. Using deep level transient spectroscopy, this donor is found to have an energy level of 0.142 eV below the conduction band at zero electric field, exhibiting behavior consistent with the Poole–Frenkel field assisted electron emission process. Using deep level transient spectroscopy in conjunction with calibrated uniaxial stress, we have determined the symmetry of the neutral 450 °C oxygen donor complex to … Show more

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Cited by 20 publications
(5 citation statements)
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“…84 and 85). Similarly, Henry, Farmer, and Meese 110 and independently Kimerling 111 found the symmetry associated with the 140 meV thermal donor emission consistent with D 2d . However, this apparent high symmetry is probably a result of either thermal averaging or just insuf-ficient resolution to resolve the true symmetry ͑C 2v ͒ as determined from IR and EPR studies by Stavola 112 and Wagner et al, 113 respectively.…”
Section: Uniaxial-stress Applicationsmentioning
confidence: 74%
“…84 and 85). Similarly, Henry, Farmer, and Meese 110 and independently Kimerling 111 found the symmetry associated with the 140 meV thermal donor emission consistent with D 2d . However, this apparent high symmetry is probably a result of either thermal averaging or just insuf-ficient resolution to resolve the true symmetry ͑C 2v ͒ as determined from IR and EPR studies by Stavola 112 and Wagner et al, 113 respectively.…”
Section: Uniaxial-stress Applicationsmentioning
confidence: 74%
“…The applied stress has been calibrated against the energy splitting of the oxygen thermal donor in Si [11,12] and a correction is made for the thermal dependence of the spring constant. When stress is applied, endpads are used to cushion the brittle sample.…”
Section: Methodsmentioning
confidence: 99%
“…6(b), at the low field region of the J-E relation illustrated in Fig. 6(c) with J/E-E 0.5 , the electron emission at the trap site caused by the misfit dislocation induced a Poole-Frenkel (P-F) emission in the current flow of Gd 2 O 3 /n-GaAs (Henry et al, 1984;Cheng et al, 2005). Moreover, the Fowler-Nordheim (F-N) tunneling regulates the leakage current flow at the high field.…”
Section: Introductionmentioning
confidence: 95%