A. HUPFBR et al. : Photoemission on Ai'Bz Semiconductor Material 505 phys. stat. sol. (b) 162, 505 (1989) Subject classification: 71.20 and 79.60; S7 Sektion Physik der Karl-Mars-Universitat Leipzigl) (a) a d VEB Werk fur Fern-nsehelektronik Berlin (b) Photoemission on AI,'BZ Semiconductor Material CdsAse, Zn3Asz, CdaPs, Zn& Crystals and Thin Films BY A. HUPFICR~) (a), D. HIRSCH~) (b), and 8. SCHULZE~) (a)The density of valence states of sputter-annealed Cd,As,, Zn,As,, (Cd,,,,Zno,,B),As,, Cd,P2, and Zn,P, crystals as well as in situ UHV deposited Cd,As, and Zn,P, thin films are determined with UV (He/Ne I, 11) and X-ray (Zr MC, AI/Mg Ka) photoemission. Some AilBz valence electron density of states data reported in literature and measured by X-ray emission and UP/XP spectroscopy are verified by the experiments. All Af IBT materials studied provide UPS/XPS curves. which are qualitatively similar to those reported for AIIBV1 compounds. MeToAaMH yjrhTpa@HoneToBo8 (He/Ne I, 11) H peHTreHoBcKoB (Zr MC, Al/Mg Kcc) @OTO-Zn,As,, (Cd,.,,Zn,.,,),As, , Cd,P, H Zn,P, KpHcTaJIJIoB, npHrOTOBneHHbIX npH noMoIqH 3JIeIrTpOHHOB Cl TeHTpOCKOl THH OIlpeAeJIeHa IIJIOTHOCTb BaJIeHTHbIX COCTOIIHHB Cd,As,, ~O M~~~~H~O B I C L I HOHaMH U peKpHCTaJIJIH3a~HOHHbIM OTmHI' OM, a TaHlKe H TOHHHX C$As, H Zn,P, CJIOeB, CY6JIHMHPOBaHHbIX ,,in situ" IIOCpe~CTBOM HCIlapeHHfl B YBB. Haum 3KCIIePAMeHTbl HOATBepXAHJIH HeKOTOpLIe JIHTepaTypHble AaHHbIe 0 IIJIOTHOCTH COCTOIIHHM BaJIeHTHbIX 3JIeKTPOHOB A!j1B? 0 6 p a 3~0~) H3MepeHHble MeTOAaMH peHTreH-3MHCCHOIIHOfi (P3c) H (POT03JIeKTpOHHOfi (Y@3c, P03c) CIIeKTPOCKOIIHH. nOJIyYaeMbIe YQ.3 H P a 3 CIIeKTpbI BCeX Ai'RT MaTepHaJIOB HaXOARTCR B KageCTBeHHOM CXOACTBe C OHY6jrHKOBCHHbIMH cneHTpanmi AI1BV1 o6pasuo~.