Synchrotron Radiation for the Understanding of Block Copolymer Self-assembly

Abstract

Synchrotron radiation offers great opportunities to improve the understanding of block copolymer morphology and self-assembly processes. In particular, GISAXS characterization is an interesting complementary method to analyze with sub-nanometer resolution the patterns that block copolymer thin films form, in addition to chemical composition. Most of the synchrotron radiation techniques are compatible with block copolymer processes, allowing for an in-situ and real time analysis of the self-assembly processes, what is very important for the analysis of process kinetics. In this contribution, we present the analysis of the self-assembly process of lamellar PS-b-PMMA block copolymer submitted to thermal annealing. The analysis of the 2D-GISAXS patterns allows the evaluation of the block copolymer morphology on formed nanopatterns and about the block copolymer kinetics.

Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

“…This BCP is amongst the most studied for nanolithography applications, as both blocks are polymers with well-known etch properties, easy to handle, present reasonable temperature ranges for annealing and similar affinity to air [ 38 , 39 , 40 ]. Extensive characterization of self-assembled PS-b-PMMA thin films has been carried out regarding annealing conditions, kinetics, defectivity, line-edge roughness and nanomechanical properties of the blocks [ 22 , 41 , 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 ].…”