Synergetic Effect of Gas Compositions on Material Properties of n‐Type Nanocrystalline Silicon Oxide Prepared by Plasma‐Enhanced Chemical Vapor Deposition

Abstract

Hydrogenated nanocrystalline silicon oxide (nc‐SiOx:H) has drawn extensive attention during the past years for the utilization in the silicon heterojunction (SHJ) solar cells. This material is demonstrated to be the key for the performance improvement of SHJ solar cells. In the present work, the influence of the process gas compositions on the optical, electronic, chemical and structural properties of n‐type nc‐SiOx:H films at the thickness of 38nm were systematically investigated. The synergetic effect of CO2 & PH3 gas flow fraction (fCO2 & fPH3) and the synergetic effect of CO2 & SiH4 gas flow fraction (fCO2 & fSiH4) on the growth of nc‐SiOx:H (n) films were demonstrated. Creatively combining the Fourier‐transform infrared (FTIR), UV‐Raman scattering spectroscopy, spectroscopy ellipsometry (SE) and photo‐thermal deflection spectroscopy (PDS) measurement, the mechanism behind the synergetic effect of the gas compositions on the material properties is analyzed.This article is protected by copyright. All rights reserved.