Syntheses and mechanical properties of Ti–B–C–N coatings by a plasma-enhanced chemical vapor deposition

Titanium-Base Nanostructure Coatings for AISI M52 Tool Steel by Gas-Phase Mix Process

“…This poor phases film was formed due to The lack of the reactive gas (ammonia or N 2 ) which represent the difficulties involved in direct evaporation processes due to fragmentation of the vaporized compounds that caused by the reaction kinetics of the compound formation in this process. [10][11][12] No significant change was observed in the produced surface film with higher ammonia flow rate until it was reached 1500Sccm. Where in Figures 3 and 4 the increase in the reactive gas flow rate of (1500 and2000Sccm respectively) will cause new hard phases to be detected by the XRD test.…”

Mechanical and tribological properties of multicomponent Ti–B–C–N thin films with varied C contents

“…Maximum hardness between 35 and 45 GPa is reported for Ti-B-C-N films with variable B and C contents by using different deposition and characterization methods, but the hardening mechanism remains unclear [9,10]. Present microindentation results combined with XPS and XRD indicate that the hardening mechanism of the Ti-B-C-N films may involve many aspects, including intrinsic hardening and extrinsic hardening, which play different roles.…”

“…For these reasons, they have been used for hard wear-resistant coatings in machining industry, diffusion barriers in microelectronics, and electrodes in semiconductor devices. The demand for advanced coatings with further increased mechanical and tribological properties has very recently led to more complex coatings as compared to binary and ternary alloyed coatings, resulting in quaternary systems like Ti-B-C-N [9,10]. However, no comprehensive work has been reported on Ti-B-C-N thin films in literature.…”

Characterization of Ti-B-C-N films deposited by dc magnetron sputtering of bicomponent Ti/B4C target

“…The methods of cathodic arc plasma evaporation [9] and CVD (in which various precursors are used) [13][14][15] have also been applied for deposition of coatings of the Ti-B-C-N system.…”