Self-sensitized photosensitive polymers with pendant photosensitive and photosensitizing groups were prepared by reaction of polystyrene containing pendant chloromethyl and photosensitizing groups, with the potassium salts of photosensitive compounds such as cinnamic acid, crotonic acid, or 2-cyano-3-(a-styryl)acrylic acid in DMF using tetrabutylammonium bromide as phase transfer catalyst. The photochemical reactivity and the practical photosensitivity of the resulting polymers were measured by IR spectrometry and by the gray-scale method, respectively. Pendant 4-nitro-1 -naphthyloxy and 4-nitrophenoxy groups in the polymers show the highest photosensitizing activity for pendant cinnamoyl groups. The photochemical reactivity and the sensitivity of these polymers are affected by the content of photosensitizing units in the polymer skeleton, the glass transition temperature of the polymers, however, is not influenced. Pendant 2-benzoylbenzoyl groups act as excellent photosensitizers for pendant crotonoyl groups, however, the photochemical reactivity of this polymer was found to be lower than that of the polymer with pendant cinnamoyl and suitable photosensitizing groups. Pendant 2-cyano-3-(a-styryl)acryloyl groups in the polymer, which exhibit high photochemical activity, are also sensitized by pendant methyleosin moieties.