Abstract:The Bi2Mn0.1V0.9O5.35-δ (BIMNVOX.10) thin films have been successfully deposited on the LaNiO3(LNO)/Si (100) substrates by chemical solution deposition process. The phases, morphology and electrical properties of samples have been studied. The BIMNVOX.10 films show a (00l)-preferred orientation and have a homogeneous distribution of grains. A low frequency dielectric dispersion observed in the films may be originated from the short distant diffusion of oxygen vacancies. The Cole-Cole plots of dielectric consta… Show more
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