Synthesis and characterization of nano-sized nitride particles by using an atmospheric microwave plasma technique

Formation of SiC nanoparticles in an atmospheric microwave plasma

“…Even though the plasma synthesis of several materials has been investigated [10–17], only a limited number of experiments have been performed on the synthesis of nanoparticles in an atmospheric plasma [18–19]. However, the established industrial production processes for nanoparticles, such as flame pyrolysis yielding millions of tons of carbon black or oxide nanoparticles per year, are performed at atmospheric pressure.…”

Synthesis of VN nanopowders by thermal nitridation of the precursor and their characterization

“…Yang et al [19] have successfully synthesized V 2 O 3 and VN nanocrystals by the decomposition of the precursor NH 4 VO 3 and following nitridation in an autoclave with metallic Na flux at 450-600 • C. Yong et al [14] have directly prepared VN nanopowders via decomposition of gas-phase vanadium oxytrichloride (VOCl 3 ) in N 2 /Ar/H 2 microwave plasma generated at the atmospheric pressure. Bang et al [20] have successfully synthesized VN nanoparticles via decomposition of gas-phase starting materials (VCl 4 ) by an atmospheric microwave plasma torch, and so on.…”

Characterization of cuprous oxide films prepared by post-annealing of cupric oxide using an atmospheric nitrogen pressure plasma torch

“…The metallic copper films (around 500 nm) were annealed in air at 500°C for 12 h. Then, the annealed films were treated using an atmospheric nitrogen pressure plasma torch [15] at 800 W for 10 or 20 min. An electrode-less atmospheric microwave torch plasma system was assembled with a commercially available magnetron (National Electronics YJ-1600, 2.45 GHz) with a maximum stationary power of 5 kW in continuous-wave mode.…”

“…Pierson et al [14] deposited copper oxide by using magnetron sputtering in various mixtures of gases. Black cupric oxide, produced by the annealing of Cu film in air, was transformed into reddish brown cuprous oxide using a microwave plasma torch at atmospheric pressure [15]. It has several advantages: (1) it can be applied at atmospheric pressure, for which an expensive vacuum system is not necessary; (2) the temperature can be increased quickly to reduce the reaction time and (3) the process supports massproduction, saving costs when it is employed on an industrial scale.…”