Synthesis and characterization of Sm(DPM)3 used as precursor for MOCVD

Decomposition Behavior of M(DPM)n (DPM = 2,2,6,6-Tetramethyl-3,5-heptanedionato; n = 2, 3, 4)

“…Spectra b, c, d, and e in Figure show the IR spectra of Sm(DPM) 3 heated at four different temperatures: 200, 270, 325, and 400 °C, respectively . These IR results indicate that the chemical bonds in Sm(DPM) 3 decompose in sequence when the sample is heated.…”

“…However, each of the complexes exhibits different decomposition temperatures and decomposed products at elevated temperatures in air (Table ). It should be pointed out that the decomposition temperatures determined by IR analysis are generally less than those determined by differential thermal analysis (DTA) owing to heat relaxation . For the sake of optimal conditions, the addition of extra oxidant, such as oxygen, is needed when MOCVD is applied for deposition of metal oxides films using M(DPM) n as precursors.…”

Lithium ion conduction in sol–gel derived lithium samarium silicate solid electrolyte

“…The intense band at 1387 cm −1 is attributed to the formation of samarium silicate linkage. The crystalline phase formation is confirmed from XRD results for the lithium samarium silicate sample heat treated to 600 • C. Further, the FTIR spectra for the sample heat treated at 800 • C revealed the strengthened lattice formation of the lithium samarium silicate [15][16][17].…”

“…It was confirmed to have stoichiometric compositions corresponding to hexagonal LiSmSiO 4 . [11][12][13][14][15][16]. Further, Sm 2 O 3 complexes with LiOH and TEOS as all the bands for pure Sm 2 O 3 are not present except at 1402 (a small peak).…”

Application of nBu2Sn(acac)2 for the deposition of nanocrystallite SnO2 films: Nucleation, growth and physical properties

“…These results show that the precursor evaporates much more quickly since the temperature of 200 • C is above the boiling point. Worthy of noting is that there is a high residual amount as 15% of the initial weight and meanwhile a sharp exothermic peak around 450 • C in the DTA curve, which represents decomposition and oxidation of the sample [26] and might cause the organic residues in the films. Therefore, film deposition at high temperatures might induce carbon/organic contamination.…”