2016
DOI: 10.1016/j.poly.2015.12.033
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Synthesis and crystal structure of cobalt(II) Schiff base precursor for cobalt oxide thin film by thermal chemical vapor deposition

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Cited by 13 publications
(2 citation statements)
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“…To the best of our knowledge, only two reports of cobalt precursors for CVD, bearing mixed O/N coordinated ligands, were published, namely, [Co­(saliprn) 2 ] (saliprn = N -isopropylsalicylaldimine) and [Co­(PyCHCOCF 3 ) 3 ] (Py = pyridine). While the former precursor was employed in an MOCVD process at atmospheric pressure and 550 °C evaporation temperature, the latter required an evaporation temperature of 150 °C at 1 × 10 –3 mbar. , Furthermore, the heteroleptic, dimeric compound [Co 2 (dmamp) 2 ­(acac) 2 ] (dmamp = 1-dimethylamino-2-methyl-2-propoxide) and its derivates were recently proposed as potential precursors for vapor-phase depositions by Chung et al This class of complexes however has despite their promising thermal properties not been employed in a deposition process yet.…”
Section: Introductionmentioning
confidence: 99%
“…To the best of our knowledge, only two reports of cobalt precursors for CVD, bearing mixed O/N coordinated ligands, were published, namely, [Co­(saliprn) 2 ] (saliprn = N -isopropylsalicylaldimine) and [Co­(PyCHCOCF 3 ) 3 ] (Py = pyridine). While the former precursor was employed in an MOCVD process at atmospheric pressure and 550 °C evaporation temperature, the latter required an evaporation temperature of 150 °C at 1 × 10 –3 mbar. , Furthermore, the heteroleptic, dimeric compound [Co 2 (dmamp) 2 ­(acac) 2 ] (dmamp = 1-dimethylamino-2-methyl-2-propoxide) and its derivates were recently proposed as potential precursors for vapor-phase depositions by Chung et al This class of complexes however has despite their promising thermal properties not been employed in a deposition process yet.…”
Section: Introductionmentioning
confidence: 99%
“…It is worth recalling that the same O-free protocol previously applied along with the sublimation of the humidified (Co 2 (CO) 8 + 1-10% hexane) precursor led to the formation of CoO [2]. From these former sublimation experiments, the atomic compositions of the films were all close to Co(44)O(44)C (12), in the form of stoichiometric CoO with C contamination. The only consistent supply of oxygen came from the decomposition of the precursor carbonyls (CO → -C ads + O ads ), hence if one tries to balance the post mortem stoichiometry (Co(44)O(44)C(12)) with elements coming from carbonyls (1 C ads for 1 O ads ), the C ads content is too low.…”
Section: The Dli-mocvd Processmentioning
confidence: 73%