The atomic layer deposition (ALD) of strontium borate films is carried out using bis(tris(pyrazolyl)borate)strontium (SrTp 2 ) and water as precursors. Self-limiting ALD growth is established at 350 8C with SrTp 2 and water pulse lengths of ! 2.0 s and ! 0.3 s, respectively. An ALD window is observed from 300 to 375 8C, in which the growth rate is 0.47 Šper cycle. The thin film compositions are assessed by elastic recoil detection analysis (ERDA) and X-ray photoelectron spectroscopy (XPS). ERDA suggests compositions of SrB 2 O 4 at growth temperatures of < 350 8C, but the boron/strontium and oxygen/strontium ratios are lower than those of SrB 2 O 4 at 350 and 400 8C. Within the ALD window, hydrogen concentrations range from 0.37(42) to 0.87 (7) at.-%, and the carbon and nitrogen concentrations are below the detection limits. XPS analyses on representative strontium borate thin films show all expected ionizations. X-ray diffraction (XRD) experiments reveal that the as-deposited films are amorphous. The surface morphology is assessed by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The rms surface roughness of typical 2 mm  2 mm areas for films deposited at 325 and 350 8C are 0.3 and 0.2 nm, respectively. SEM images of these films show no cracks or pinholes.