Oxide Ultrathin Films 2011
DOI: 10.1002/9783527640171.ch1
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Synthesis and Preparation of Oxide Ultrathin Films

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Cited by 4 publications
(3 citation statements)
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“…There is a wealth of preparation techniques, which have been applied for the growth of ultrathin oxide films, ranging from physical vapor deposition (PVD) under highly controlled ultrahigh vacuum (UHV) conditions, to chemical methods, involving chemical vapor deposition (CVD) and liquid-precursor-based techniques . Here, we will briefly summarize preparation routes within a surface science perspective, focusing mainly on the PVD of metal atoms onto a dissimilar single-crystal metal substrate.…”
Section: Experimental Aspects and Theoretical Methodsmentioning
confidence: 99%
“…There is a wealth of preparation techniques, which have been applied for the growth of ultrathin oxide films, ranging from physical vapor deposition (PVD) under highly controlled ultrahigh vacuum (UHV) conditions, to chemical methods, involving chemical vapor deposition (CVD) and liquid-precursor-based techniques . Here, we will briefly summarize preparation routes within a surface science perspective, focusing mainly on the PVD of metal atoms onto a dissimilar single-crystal metal substrate.…”
Section: Experimental Aspects and Theoretical Methodsmentioning
confidence: 99%
“…In comparison to PLD and sputtering, despite the reduced deposition rate, the single element sources used for the MBE growth process allow for materials engineering at the atomic scale. For further reading on PVD techniques and the epitaxial growth of films, we recommend the following literature on PLD [55][56][57][58], sputtering [58], and MBE [58,59]. Note that all these PVD growth processes involve ultra-high vacuum growth chambers with a geometry that is compatible with in situ investigations.…”
Section: Ferroelectricity At the Epitaxial Growth Temperaturementioning
confidence: 99%
“…Chemical methods for thin-film deposition are an affordable and versatile alternative to physical deposition techniques (pulsed laser deposition, sputtering, molecular beam epitaxy, etc. ). In particular, deposition from a solution is preferred to avoid the use of high-vacuum chambers, and, a priori, is suitable for coatings over large areas and complex-shaped objects.…”
Section: Introductionmentioning
confidence: 99%