Synthesis and transformations of Ti-containing structures on the surface of silica gel

Малков, А. А.; Соснов, Е. А.; Осипенкова, О. В.; Малыгин, А. А.

doi:10.1016/s0169-4332(96)00568-5

Cited by 16 publications

(7 citation statements)

References 10 publications

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“…Analogous results were obtained earlier in studies of the vapour-phase hydrolysis of titanium oxychloride groups formed in the temperature range of 25 ± 200 8C on silica gel samples dehydroxylated at T o = 600 8C. 22,24 VI. Hydrolytic stability of the titanium oxychloride groups on silicas…”

Section: Ir Spectroscopic Studiessupporting

confidence: 83%

“…2 a, curve 3 H ) demonstrated an insignificant (by *10%) decrease in the AB intensity for the Si7O7Ti bond, which could be caused by its cleavage in :Si7O7TiCl 3 groups during hydrolysis. 22,24 3. In the vicinity of 700 ± 800 cm 71 , the absorption bands with maxima at 860 and 880 cm 71 appeared in differential spectra (curves 3 H in Fig.…”

Section: Ir Spectroscopic Studiesmentioning

confidence: 99%

“…The first step of the synthesis, viz., the chemisorption of TiCl 4 vapour on the surface of different silicas, has been discussed in detail in studies by Aleskovskii, Kol'tsov and their successors (see Refs 1 ± 6,14,18,32 ± 41) including those carried out in the past two decades (see Refs 9,17,20,22,24,42 ± 49) and also in publications by other scientists from different countries (Refs 8,10,11,15,16,19,21,23,27,29,50 ± 92). It was almost generally agreed that in a certain temperature interval, the primary step of chemisorption on the silica surface preferentially occurred on the hydroxyl groups to form TiCl x groups bound to the support by one, two or three bonds (x = 3, 2 or 1, respectively) (from here on, :Si7 designates Si atoms on the silica surface):…”

Section: Introductionmentioning

confidence: 99%

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Hydrolytic stability of the Si–O–Ti bonds in the chemical assembly of titania nanostructures on silica surfaces

Соснов¹,

Малков²,

Малыгин³

2010

Russ. Chem. Rev.

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Section: Ir Spectroscopic Studiessupporting

confidence: 83%

Section: Ir Spectroscopic Studiesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Hydrolytic stability of the Si–O–Ti bonds in the chemical assembly of titania nanostructures on silica surfaces

Соснов¹,

Малков²,

Малыгин³

2010

Russ. Chem. Rev.

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“…The hydrogen atom of a i±OH group combines with a chlorine of the TiCl 4 molecule, releasing HCl, while the remaining parts of the TiCl 4 molecule are bonded to the surface, forming a i±O±TiCl 3 species. Ligand exchange reaction has been proposed to occur with one, [7,17,20,34,35] two, [7,17,20,34,35] or maybe even three [2,17±19,34] i±OH groups at the same time. At room temperature, ligand exchange reaction already occurs although not all i±OH groups are consumed through ligand exchange at this temperature.…”

Section: Ligand Exchangementioning

confidence: 99%

Formation of Metal Oxide Particles in Atomic Layer Deposition During the Chemisorption of Metal Chlorides: A Review

Puurunen

2005

Chemical Vapor Deposition

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As has been known for a decade, metal oxide particles can form in a single reaction of gaseous metal chlorides with solid oxides. This is an undesirable effect in the fabrication of thin films by atomic layer deposition (ALD). This work reviews the experimental results related to the metal oxide particle formation and the mechanisms suggested to account for it. The suggested mechanisms cannot explain the observations, but systematic analysis of the possible reaction paths delivers one reaction mechanism candidate, based on a reaction between surface chlorine groups and the hydroxyl groups of gaseous metal hydroxychloride intermediates. The consequences of the proposed mechanism are discussed.

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“…Recently, thin oxide layers (oxide nanostructures) have been increasingly applied for the production of highly active catalysts, ion-selective field-effect transistors, and other microelectronic devices. The method of molecular layer-by-layer deposition (MLD) from the gas phase allow one to produce one-and multicomponent element-oxygen nanostructures of different thicknesses on solid substrates [1][2][3][4][5][6][7][8][9]. Previously, we studied the electrosurface characteristics of one-component nanostructures synthesized on oxide substrates with the involvement of hydroxy and methoxy functional groups [10][11][12][13][14][15][16].…”

mentioning

confidence: 99%

Synthesis and Electrosurface Properties of One- and Two-Component Nanostructures

et al. 2005

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The interest in the study of the formation mechanisms and the structure of electrical double layers (EDL) at oxide-electrolyte solution interfaces is predetermined by both the abundance of oxides in the nature and their use in practice. Recently, thin oxide layers (oxide nanostructures) have been increasingly applied for the production of highly active catalysts, ion-selective field-effect transistors, and other microelectronic devices. The method of molecular layer-by-layer deposition (MLD) from the gas phase allow one to produce one-and multicomponent element-oxygen nanostructures of different thicknesses on solid substrates [1-9]. Previously, we studied the electrosurface characteristics of one-component nanostructures synthesized on oxide substrates with the involvement of hydroxy and methoxy functional groups [10][11][12][13][14][15][16]. Data on electrosurface properties of composite (multicomponent) nanostructures are unavailable in the literature. Therefore, the goal of this work was the synthesis, study, and comparison of electrosurface properties of one-and two-component Al-and Ti-based nanostructures formed as films of different thicknesses on oxide substrates. In addition, colloidal characteristics of element-oxygen nanostructures of different compositions were compared with those of the substrates and corresponding bulk (hydr)oxides.One-and two-component nanostructures were synthesized with the involvement of hydroxy functional groups according to the following reactions (with the reference to a silica substrate):where E = Al or Ti.Samples were prepared in a flow of air, which was preliminarily dried over phosphorous oxide to a residual moisture content of 2 mg/m 3 . The dried air was saturated with either titanium chloride vapor or the vapor of solid aluminum chloride heated to 200°ë . After the excess of hydrogen chloride was removed with the dried air, the reaction product was treated with water vapor at 200°ë until HCl escaped from the reactor. In order to maintain a specified temperature in the reaction zone, a Nichrome wire was used, to which a necessary voltage was applied. The temperature was measured with a thermocouple.Aluminum-and titanium-oxygen nanostructures of different thicknesses, which were set by number n of the cycles of surface reactions (1) and (2), were synthesized on silicon oxide and aluminum hydroxide substrates. Hereafter, these structures are conventionally designated as n Al 2 O 3 / SiO 2 , n TiO 2 / AlOOH, and n TiO 2 /5 Al 2 O 3 / SiO 2 .Aerosil OX-50 (Degussa) (with a specific surface area S 0 = 42.5 m 2 /g, as determined by the BET method using the thermal desorption of argon with chromatographic recording) and a plane-parallel quartz capillary were used as silicon oxide substrates. The plane-parallel capillary was formed by the plates of KU quartz glass whose inner surfaces were preliminarily ground and polished (14th class). The size of asperities on SiO 2 plates did not exceed 0.1 µ m. Capillary length (5.8 cm) was determined by the geometric sizes of an initial pl...

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Synthesis and transformations of Ti-containing structures on the surface of silica gel

Cited by 16 publications

References 10 publications

Hydrolytic stability of the Si–O–Ti bonds in the chemical assembly of titania nanostructures on silica surfaces

Hydrolytic stability of the Si–O–Ti bonds in the chemical assembly of titania nanostructures on silica surfaces

Formation of Metal Oxide Particles in Atomic Layer Deposition During the Chemisorption of Metal Chlorides: A Review

Synthesis and Electrosurface Properties of One- and Two-Component Nanostructures

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