Synthesis, characterization and properties of photoresponsive polymers comprising photocrosslinkable pendant chalcone moieties

Tamilvanan, M.; Pandurangan, A.; Reddy, Boreddy S. R.; Subramanian, K. G.

doi:10.1002/pi.2124

Cited by 14 publications

(6 citation statements)

References 29 publications

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“…This will enable chalcone derivatives to have more interesting properties, including better thermal stability and resistance capacity than cinnamoyl groups. However, most research work has focused on compounds with chalcone groups embedded in the main chain or pended as side chains [29][30][31][32][33][34][35][36]. As the chalcone groups of the dichalcone functionalized monomer can be dimerized under UV light irradiation, it is theoretically possible to obtain linear polymers if the reaction takes place intermolecularly [19,37,38].…”

Section: Introductionmentioning

confidence: 99%

Novel UV-sensitive bis-chalcone derivatives: synthesis and photocrosslinking properties in solution and solid PMMA film

et al. 2011

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A series of chalcone derivatives in which two chalcone groups are attached by alkyldioxy chains were synthesized and characterized by 1 H NMR, UV-Vis, and Fourier transform infrared (FTIR) spectral analysis. Upon the irradiation of 365-nm UV light, the chalcone groups in the molecules underwent [2p ? 2p] photodimerization. The photocrosslinking properties were investigated both in solution and in polymethyl methacrylate (PMMA) solid films on quartz plate. It has been found that the photocrosslinking rates of the compounds depended on the different flexibility of the functional groups, which was determined by the length of the spacer chain between the two chalcone moieties. The longest soft chain containing derivatives has a faster photocrosslinking rate both in solution and in solid film. Irradiated by polarized ultraviolet light (PUV), all of the films doped with bis-chalcone derivatives showed an anisotropic absorption property, which may give a promising application as LC-alignment materials.

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Section: Introductionmentioning

confidence: 99%

Novel UV-sensitive bis-chalcone derivatives: synthesis and photocrosslinking properties in solution and solid PMMA film

et al. 2011

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“…Photodimerization behavior of chalcone moieties was investigated and applied to photosensitive polymers [18][19][20][21].…”

Section: Resultsmentioning

confidence: 99%

Hybrid UV Curing System Using Methacrylates Having a Chalcone Moiety

Okamura

Ueda

Shirai

2013

J. Photopol. Sci. Technol.

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“…4-Pyridinyl-4´-(2-hydroxyethoxy)styryl ketone (PHSK, the chalcone) was prepared by reacting of 4-(2-hydroxyetoxy)benzaldehyde with 4-acetylpyridine in methanol in presence of NaOH as base according to the method adopted from the literature [25]. The photosensitive methacrylate monomer (PHSKM) having pendant chalcone group was prepared from the reaction of the chalcone (PHSK) and methacryloyl chloride.…”

Section: Synthesis and Characterizationmentioning

confidence: 99%

Poly[4-pyridinyl-4´-(2-methacryloyloxyethoxy)styryl ketone-co-2-hydroxypropyl methacrylate]: Synthesis, Characterization, Thermal and Electrical properties, and Photocrosslinking behavior

Aygün¹,

Çoşkun²

2018

El-Cezeri Fen Ve Mühendislik Dergisi

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Synthesis of a chalcone bearing pyridine ring, 4-pyridinyl-4´-(2-hydroxyethoxy)styryl ketone, was carried out from the reaction of 4-acetyl pyridine and 4-(2-hydroxyetoxy)benzaldehyde in an aqueous solution of NaOH. 4-Pyridinyl-4´-(2-methacryloyloxyethoxy)styryl ketone which is the methacrylate monomer bearing chalcone structure in side chain, was obtained from acylation of 4-pyridinyl-4´-(2-hydroxyethoxy)styryl ketone with methacryloyl chloride in the cold. The copolymer of 4-pyridinyl-4´-(2-methacryloyloxyethoxy)styryl ketone and 2-hydroxypropyl methacrylate was prepared by free radical polymerization in presence of AIBN at 70 o C. FTIR, 1 H-NMR and 13 C-APT spectroscopic techniques were used for structural characterization of the Chalcone, the monomer and the copolymer. Thermal characterization of the copolymer was carried out using DSC and TGA techniques. DSC curve shows that this copolymer has a glass transition temperature of 78 o C. The TGA curve shows that decomposition given volatile product started at 230 °C and a residue of 21% left at 500 °C. Dielectric constant (ε´) of the copolymer decreased rapidly from 8.8 to 4.2 with increasing frequency in the range of 100-1000 Hz, and after this frequency ε´ quantity remained constant at a value such as 4.2. ε´ Value of the copolymer increased only from 4.2 to 4.9 with increasing from 290 K to 385 K. The AC conductivity of the copolymer increases from 5.01x10-10 S/cm to 126.0x10-10 S/cm as the frequency increase from 100 Hz to 5000 Hz. The AC conductivity increases slightly with increasing temperature, 2.52x10-9 S/cm at 300 K, and 2.89x10-9 S/cm at 385 K. After a solution of the copolymer was irradiated using UV light at 365 nm at room temperature, the absorption band at 356 nm disappeared and a new band was seen at 284 nm.

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Synthesis, characterization and properties of photoresponsive polymers comprising photocrosslinkable pendant chalcone moieties

Cited by 14 publications

References 29 publications

Novel UV-sensitive bis-chalcone derivatives: synthesis and photocrosslinking properties in solution and solid PMMA film

Novel UV-sensitive bis-chalcone derivatives: synthesis and photocrosslinking properties in solution and solid PMMA film

Hybrid UV Curing System Using Methacrylates Having a Chalcone Moiety

Poly[4-pyridinyl-4´-(2-methacryloyloxyethoxy)styryl ketone-co-2-hydroxypropyl methacrylate]: Synthesis, Characterization, Thermal and Electrical properties, and Photocrosslinking behavior

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