Synthesis of a-C coatings by HPPMS using Ar, Ne and He as process gases

Bobzin, Kirsten; Brögelmann, Tobias; Kalscheuer, Christian; Engels, Martin

doi:10.1016/j.surfcoat.2016.07.099

Cited by 23 publications

(15 citation statements)

References 28 publications

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“…The substrates were biased during the deposition using RF biasing, with a DC self-bias of −100 V during C deposition, and at −50 V for Ti deposition. The biasing voltage at −100 V was chosen based on previous studies that showed an optimum around this values in terms of film density and hardness [9,22,28,31]. All samples were obtained at a total pressure of 2 Pa, maintained by an automatic valve that regulates the pumping section.…”

Section: Methodsmentioning

confidence: 99%

“…Sputtering of C under high peak currents as in the case of HiPIMS is a particularly challenging task, one of the main difficulties laying in the fact that micro-arcing can occur on the sputtered surface [28]. The proximity to an arc discharge can potentially provide advantages such as higher ionization degree, denser and harder coatings [33], but can also bring some of the disadvantages, like the micro-droplets formation on the growing film [22,28]. Therefore, in this work we focused on finding a stable process with discharge currents sufficiently high to achieve significant ionization of C while keeping the number of arcing events low.…”

Section: Process Descriptionmentioning

confidence: 99%

“…This finding confirms the results previously described in [21] and attribute to the high peak current density of 2 A/cm 2 used in this work. It was previosly shown that when using Ne only as sputtering gas the hardness of the coatings could be increased significantly, when compared to coatings obtained in Ar only [22]. It is to be noted that the peak power was increased by a factor of 1.5 when using Ne compared to Ar [22], making it difficult to fully separate the gas effect from the current increase effect.…”

Section: Characterization Thin Film Deposited On Si Substratementioning

confidence: 99%

“…In this respect, Ne (E i = 21.5 eV) was shown to be a good candidate for increasing T e [18] and obtaining higher peak current values both to the target and to the substrate [21]. The use of Ne as sputtering gas was also investigated in a semi-industrial setup [22]. The maximum hardness of DLC coatings obtained using Ne was 45 GPa, significantly higher than the hardness of the coatings obtained using Ar, 25 GPa [22].…”

Section: Introductionmentioning

confidence: 99%

“…The use of Ne as sputtering gas was also investigated in a semi-industrial setup [22]. The maximum hardness of DLC coatings obtained using Ne was 45 GPa, significantly higher than the hardness of the coatings obtained using Ar, 25 GPa [22]. In more recent contributions it was also shown that the ionization degree of C can be increased by using positive pulses in the afterglow of HiPIMS [23,24].…”

Section: Introductionmentioning

confidence: 99%

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A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

et al. 2020

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In this work, we investigate the use of high power impulse magnetron sputtering (HiPIMS) for the deposition of micrometer thick diamond like carbon (DLC) coatings on Si and steel substrates. The adhesion on both types of substrates is ensured with a simple Ti interlayer, while the energy of impinging ions is adjusted by using RF (Radio Frequency) biasing on the substrate at −100 V DC self-bias. Addition of acetylene to the working Ar+Ne atmosphere is investigated as an alternative to Ar sputtering, to improve process stability and coatings quality. Peak current is maintained constant, providing reliable comparison between different deposition conditions used in this study. The main advantages of adding acetylene to the Ar+Ne gas mixture are an increase of deposition rate by a factor of 2, when comparing to the Ar+Ne process. Moreover, a decrease of the number of surface defects, from ~40% surface defects coverage to ~1% is obtained, due to reduced arcing. The mechanical and tribological properties of the deposited DLC films remain comparable for all investigated gas compositions. Nanoindentation hardness of all coatings is in the range of 25 to 30 GPa, friction coefficient is between 0.05 and 0.1 and wear rate is in the range of 0.47 to 0.77 × 10−6 mm3 N−1m−1.

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Section: Methodsmentioning

confidence: 99%

Section: Process Descriptionmentioning

confidence: 99%

Section: Characterization Thin Film Deposited On Si Substratementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

et al. 2020

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Crack Resistance of Diamond‐Like Carbon Coatings

Bobzin¹,

Brögelmann²,

Carlet

et al. 2021

Vak Forsch Prax

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Summary The aim of the current paper is the study of the crack resistance of diamond‐like carbon (DCL) coatings deposited by direct current magnetron sputtering (dcMS) and high‐power pulse magnetron sputtering (HPPMS) with different process parameters. For this purpose nanoindentation with a very high force resolution of RFN ≤ 1 nN was used to analyze different a‐C coatings, which were deposited under variation of the process gases argon, helium and neon. Owing to significantly high force resolution of the indenter, a large number N = 31,872 of data points in each force‐displacement curve was recorded, which enabled the desired analyses. Based on the results, it can be stated that the nanoindentation is able to provide knowledge on the crack formation of DLC coatings. The coatings deposited with neon show a more promising behavior in point of elastic‐plastic properties. In addition, the evaluation of the force‐displacement curves indicates a higher resistance to crack formation of these coatings. Furthermore, investigations on the influence of the process gas pressure were conducted using Ne and three pressures p = 2.0 Pa, p = 1.5 Pa and p = 1.0 Pa. The results show that applying the moderate gas pressure can generate coatings with the highest toughness compared to the coatings deposited with higher and lower gas pressures.

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Hochionisiere Abscheideverfahren für Sensor- und Hartstoffschichten auf Kohlenstoffbasis

Bandorf

2018

J Oberfl Techn

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Synthesis of a-C coatings by HPPMS using Ar, Ne and He as process gases

Cited by 23 publications

References 28 publications

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

A Strategy for Alleviating Micro Arcing during HiPIMS Deposition of DLC Coatings

Crack Resistance of Diamond‐Like Carbon Coatings

Hochionisiere Abscheideverfahren für Sensor- und Hartstoffschichten auf Kohlenstoffbasis

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