In this paper, we describe the investigation of chemical vapor
deposition (CVD) of carbon from benzene
and cyclohexane on a particular pitch-based active carbon fiber (ACF)
at different deposition temperatures
as a means of controlling the pore size of ACF in order to induce true
molecular sieving capability and
to discuss the mechanism of carbon deposition. This study showed
that the specific temperature range
700−800 °C was very effective. In this range, deposition of
amorphous carbon was restricted to the pore
wall and became saturated at the level of 11% weight increase, as
further deposition stopped. This treatment
greatly enhanced the molecular sieve separation of CH4 from
CO2. Reduction of pore size appeared to
be
limited by the thickness of the benzene plane, since no further carbon
deposit took place when the pore
could no longer accept benzene. Higher temperatures allowed
deposition to occur on the outer surface of
ACF, which plugged the pore completely on extended reaction time.
Cyclohexane was found to be inferior
to benzene as a carbon precursor, as it decomposed too rapidly in the
gas phase at the temperature range
used and precipitated the carbon plugging the pores. Thus, high
molecular sieving selectivity was not
obtained.