2013
DOI: 10.1080/10420150.2013.804822
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Synthesis of composite TiN/Ni3N/a-Si3N4thin films using the plasma focus device

Abstract: Composite films of TiN/Ni 3 N/a-Si 3 N 4 were synthesized using the Mather-type plasma focus device with varying numbers of focus deposition shots (5, 15, and 25) at 0 • and 10 • angular positions. The composition and structural analysis of these films were analyzed by using Rutherford backscattering (RBS) and X-ray diffraction (XRD). Scanning electron microscope and atomic force microscope were used to study the surface morphology of films. XRD patterns confirm the formation of composite TiN/Ni 3 N/a-Si 3 N 4… Show more

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Cited by 4 publications
(2 citation statements)
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“…It is a low-energy (3.3 kJ) Mather-type plasma focus powered by single Maxwell (30 µF, 15 kV) fast discharging capacitor. Further details and operation of plasma focus can be found elsewhere (3,(19)(20)(21). A hot, dense, short-lived, pinched plasma column is developed in the plasma focus device.…”
Section: Methodsmentioning
confidence: 99%
“…It is a low-energy (3.3 kJ) Mather-type plasma focus powered by single Maxwell (30 µF, 15 kV) fast discharging capacitor. Further details and operation of plasma focus can be found elsewhere (3,(19)(20)(21). A hot, dense, short-lived, pinched plasma column is developed in the plasma focus device.…”
Section: Methodsmentioning
confidence: 99%
“…Our plasma research group have already grown TiN/Si 3 N 4 , nc-(Ti, Al) N/a-Si 3 N 4 , and TiN/Ni 3 N/a-Si 3 N 4 thin composite films using the dense plasma focus device. [20][21][22] In the present work, we synthesize composite (ZrSiN) films on silicon substrates at ambient temperature using the PF device. Microstructures, crystallite sizes, microstrains, texture coefficients, surface morphologies, and elemental concentrations of the composite films are investigated in terms of focus shots.…”
Section: Introductionmentioning
confidence: 99%