2004
DOI: 10.1016/j.solidstatesciences.2003.10.010
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Synthesis of crystallized TaON and Ta3N5 by nitridation of Ta2O5 thin films grown by pulsed laser deposition

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Cited by 44 publications
(30 citation statements)
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“…Over the past decade, thermal nitridation of metal oxide thin films such as tantalum oxide, silicon oxide, and powders such as indium oxide and gallium oxide, in the presence of ammonia, have been widely studied. 5,6 However, fundamental understanding of the process of nitrogen incorporation into metal oxides in general has not been fully explored.…”
Section: Introductionmentioning
confidence: 99%
“…Over the past decade, thermal nitridation of metal oxide thin films such as tantalum oxide, silicon oxide, and powders such as indium oxide and gallium oxide, in the presence of ammonia, have been widely studied. 5,6 However, fundamental understanding of the process of nitrogen incorporation into metal oxides in general has not been fully explored.…”
Section: Introductionmentioning
confidence: 99%
“…Ionic conductivity studies focusing on the behavior of N 3− anions have yielded promising results indicating the possibility of N 3− ion conducting materials [4 -6]. Transition metal oxide nitrides are also compounds possibly suitable as dielectrics [7,8] in microelectronic devices, or as chemical gas sensors [9].…”
Section: Introductionmentioning
confidence: 99%
“…It should be pointed out that the easier CN x decomposition in TaU will induce inhomogeneous N species atmosphere and consequent overreactions. [4] Thus, the formation and stabilization of CN x on large SiO 2 surface is important for TaON and Ta 3 N 5 controlled synthesis because of the suppression of N source release (Figure 2 c).…”
mentioning
confidence: 99%
“…The traditional method using NH 3 is limited for the danger associated with using NH 3 at high temperature and the complexity related to the rigid control of gas composition, flow rate, and pressure. [4, 5] Moreover, although urea and cyanamide have been reported as safe nitrogen sources for preparing tantalum nitrides, only impure and deeply reduced TaN could be obtained, as an effective control on reactions is absent. [6] Recently, we discovered that the controlled release of N source from urea is significant to control metal nitridation.…”
mentioning
confidence: 99%
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