Synthesis of di-and triblock-copolymers of vinylic monomers in the presence of high molecular weight nitroxyl radicals formed in situ from N-tert-butyl-C-phenylnitrone

Abstract

High molecular weight nitroxyl radicals formed directly in polymerization system (in situ) from N tert butyl C phenylnitrone are efficient agents for the chain growth control and allow one to perform synthesis of di and triblock copolymers based on a number of vinylic mono mers (styrene, methyl methacrylate, N vinylpyrrolidone, and butyl acrylate) under more mild temperature regimes than their low molecular weight analogs. The macromolecular structures synthesized are characterized by GPC, NMR and IR spectroscopy, and MALDI TOF MS method.