2011
DOI: 10.1039/c1py00194a
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Synthesis of diblock copolymers bearing p-methoxyphenacyl side groups

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Cited by 18 publications
(14 citation statements)
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“…Materials : Rhodamine‐labeled PEI, MNBMA, CMA, 2‐[(2‐hydroxyethyl)disulfanyl]ethyl methacrylate, and MPMA were synthesized as reported elsewhere …”
Section: Methodsmentioning
confidence: 99%
“…Materials : Rhodamine‐labeled PEI, MNBMA, CMA, 2‐[(2‐hydroxyethyl)disulfanyl]ethyl methacrylate, and MPMA were synthesized as reported elsewhere …”
Section: Methodsmentioning
confidence: 99%
“…Light‐responsiveness is usually imparted to block copolymers by the incorporation of photosensitive moieties into their structure, either at the junction between two blocks12–20 or as side‐groups located along one or more of the sequences 21–34. Besides the well‐known azobenzenes, derivatives of 2‐nitrobenzyl alcohols have become one of the most famous photosensitive moieties used in polymer science.…”
Section: Introductionmentioning
confidence: 99%
“…Especially o -nitrobenzyl chromophores are discussed as promising candidates for biological applications since even stimulation with NIR light is possible (see Section 3.3 ). Consequently, several block copolymers bearing o -nitrobenzyl ester groups in the side chain in combination with blocks of PEO/PEG or POEGMA [ 89 , 90 , 91 , 92 , 93 , 94 , 95 , 96 , 97 ], polystyrene [ 98 , 99 , 100 ], poly(methyl acrylate) [ 101 ], poly(2-ethyl-2-oxazoline) [ 102 ], or polydimethylacrylamide [ 103 ] have been synthesized and investigated towards their response upon irradiation with far UV light. Exemplarily, Liu and Dong showed the photo-controlled release of the anticancer drug doxorubicin from a biodegradable polypeptide-based poly( S -( o -nitrobenzyl)- l -cysteine)- block -poly(ethylene oxide) block copolymer.…”
Section: λ-Dependent Photo-response In Block Copolymer Nanostructumentioning
confidence: 99%
“…This approach enables the regulation of the amphiphilic imbalance and the crosslinking density of block polymer micelles simultaneously. The afore-mentioned p -methoxy-phenacyl esters are also the subject of more recent works by Bertrand et al [ 98 , 142 ]. Thereby, the absence of a nitro group facilitates controlled polymerization procedures of the respective monomers rendering these compounds favorable if compared to the previously discussed nitrobenzyl esters.…”
Section: λ-Dependent Photo-response In Block Copolymer Nanostructumentioning
confidence: 99%