“…Apart from a nanostructure coating technology, there exists an emergent set of synthesis techniques that realize nanomaterials by using either the ALD-deposited layer or an adjacent material as a sacrificial entity. The preparation of (i) free-standing ALD layers through the dissolution of a sacrificial substrate, 8 (ii) the high-temperature desorption of Cu from Al 2 O 3 -coated Cu nanowires, 36 (iii) the coating of electrospun fibers, 7 carbon nanocoils, 37 polymeric structures, 38,39 or cellulose 40 followed by the removal of the core material through calcination, and (iv) the application of a conformal etch-resistant layer to a nanostructured template (e.g., anodic aluminum oxide, metal organic frameworks) followed by the removal of the template in a liquid etchant, 10 all provide conceptually straightforward examples of this strategy. The formation of sub-10 nm air-filled plasmonic nanogaps with tunable widths have relied upon the use of a sacrificial ALDdeposited oxide that first defines a dielectric-filled nanogap between adjacent metal structures, after which it is removed with a selective etch.…”