Synthesis of multi-layer graphene films on silica using physical vapour deposition

Abstract

Carbon films and underlying copper template-layers have been deposited energetically in the same filtered cathodic vacuum arc system at 750 °C. The high quality <111> copper templatelayers were supported on either silicon or silica and were subsequently sacrificially etched. On silicon, copper silicide formed during the copper deposition process, inhibiting ordered growth in the carbon film. On silica, large areas of multi-layer graphene (up to ~10 layers) oriented parallel to the substrate were synthesised and these remained intact after the sacrificial etching process. The ability to produce both copper and multilayer graphene layers in one system enables simplified fabrication of this material.

Applications of Phosphorene and Black Phosphorus in Energy Conversion and Storage Devices

“…The microcleavage approach has been successfully exploited in the first isolations of many 2D membranes such as graphene, MoS 2 , WS 2 , h‐BN, and MXene . Due to the ease of isolation by a Scotch tape, phosphorene has been vastly employed in the research of fundamental physics and electronic devices.…”

Highly Rectifying Conical Nanopores in Amorphous SiO2 Membranes for Nanofluidic Osmotic Power Generation and Electroosmotic Pumps

“…a-SiO 2 membranes can be readily integrated into lab-on-a-chip devices. Additionally, a-SiO 2 is well suited for chemical surface functionalization through a variety of techniques, such as physical vapor deposition, electroless plating, and atomic layer deposition . Another well-studied technique is the silanization process: due to the oxide/hydroxyl groups on the surface, alkylsilane or organosilane monolayers can be self-assembled .…”

Sensitivity-Enhancing Strategies of Graphene Field-Effect Transistor Biosensors for Biomarker Detection

“…This process entails heating raw materials like graphite to elevated temperatures, prompting their evaporation or release of atoms, molecules, or clusters, which then deposit onto the substrate surface, forming thin films. However, the limited adoption of PVD is primarily attributed to the adverse effects of high-energy particle bombardment on the graphene lattice, leading to the generation of point defects. − …”