“…Meanwhile, the thickness, morphology, and periodicity of the nanostructured film in different processing conditions has been characterized using a variety of techniques (both in situ and post-deposition), such as elipsometric measurements, light interference, adsorption isotherms, atomic force microscopy (AFM), scanning electron microscope (SEM), X-ray diffraction (XRD), X-ray reflectivity (XRR), transmission electron microscopy (TEM), and surface plasmon spectroscopic measurements, etc. [15,18,19,20,21,22,23]. …”