2008
DOI: 10.1021/cg800536w
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Synthesis of NiS and MnS Nanocrystals from the Molecular Precursors (TMEDA)M(SC{O}C6H5)2 (M = Ni, Mn)

Abstract: The compounds (TMEDA)M(SC{O}C 6 H 5 ) 2 (M ) Ni, 1; Mn, 2) have been synthesized and characterized by X-ray crystallography. Both of the monomeric molecular precursors have been used to make the corresponding monodispersed NiS (two different phases) and cubic phase MnS nanocrystals (NCs) under specific experimental conditions. Changing the surfactants yielded low-temperature rhombohedral β-NiS NCs with millerite structure in dodecanethiol and high-temperature hexagonal R-NiS NCs with NiAs-type structure in ole… Show more

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Cited by 61 publications
(35 citation statements)
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“…1(g)) reveals that this crystal plane distance of Ni x S y for Ni x S y /rGO-10 is 0.296 nm, which is consistent with the previous report about α-NiS. 15,16 Finally, when the D.I. water is totally replaced by EG (Ni x S y /rGO-15), the aggregated Ni x S y microspheres form and obviously separate with rGO ( Fig.…”
supporting
confidence: 90%
“…1(g)) reveals that this crystal plane distance of Ni x S y for Ni x S y /rGO-10 is 0.296 nm, which is consistent with the previous report about α-NiS. 15,16 Finally, when the D.I. water is totally replaced by EG (Ni x S y /rGO-15), the aggregated Ni x S y microspheres form and obviously separate with rGO ( Fig.…”
supporting
confidence: 90%
“…Due to their interesting electronic and catalytic properties, various synthesis protocols for the formation of nanocystalline NiS at moderate to low temperatures (<150 • C) have been proposed (Jeong and Manthiram 2001;Meng et al 2002;Sun 2003;Tian et al 2009). In this respect, SRB mediated growth may be considered as a method to synthesize metastable nanocrystalline α-NiS with a sharp size distribution.…”
Section: Formation Of Nanocrystalline Metal Sulfidesmentioning
confidence: 99%
“…Many efforts have been devoted to the morphological control and spatial patterning of semiconductor nanocrystals of metal sulfides [5][6][7].…”
Section: Introductionmentioning
confidence: 99%