“…The authors describe an initial nucleation and subsequent formation of bigger aggregates due to film-forming material randomly diffusing across the liquid’s surface [ 40 , 41 , 42 ]. Whether the precursor material arriving at the liquid substrate forms floating clusters or submerges into the liquid depends on the intermolecular forces predominating gravitational effects [ 27 , 41 , 42 , 43 ]. In accordance with the deposition of metal films, the occurrence of internal film stress and resulting wrinkling has been described for plasma-enhanced chemical vapor deposition (PECVD) processes which have been applied using monomers, such as ethylene, methane, hexamethyldisiloxane (HMDSO), silane or a mixture of carbon tetrafluoride and argon, to deposit closed films on liquids [ 27 , 43 ].…”