2012
DOI: 10.1063/1.4722942
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Synthesis of the superlattice complex oxide Sr5Bi4Ti8O27 and its band gap behavior

Abstract: Structural and electrical properties of c-axis epitaxial homologous Sr m−3 Bi 4 Ti m O 3m+3 (m=3, 4, 5, and 6) thin films

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Cited by 9 publications
(7 citation statements)
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“…In non-magnetic Aurivillius Sr mÀ3 Bi 4 Ti m O 3mþ3 (SBTi) system, [16][17][18][19][20] period as large as m ¼ 8 has been realized by the thin film epitaxy. 21 Very few work has been reported about the epitaxial fabrication of thin films with periods larger than 8. Therefore, it would be interesting to explore the growth limit on the period, together with the pressing demand for multiferroic Aurivillius phase thin films with very large period numbers.…”
mentioning
confidence: 99%
“…In non-magnetic Aurivillius Sr mÀ3 Bi 4 Ti m O 3mþ3 (SBTi) system, [16][17][18][19][20] period as large as m ¼ 8 has been realized by the thin film epitaxy. 21 Very few work has been reported about the epitaxial fabrication of thin films with periods larger than 8. Therefore, it would be interesting to explore the growth limit on the period, together with the pressing demand for multiferroic Aurivillius phase thin films with very large period numbers.…”
mentioning
confidence: 99%
“…For instance, the deposition of highly textured, oriented and uniform thin films can in principle extensively improve desired physical properties such as ferroelectric polarization, in material systems where the polarization is dependent on crystal orientation. Aurivillius phase materials have been previously fabricated in both bulk and thin film form using molten solid state reaction (MSS), 24 sol-gel 10 and pulse laser deposition (PLD) processes, 25 however, to date no report is available on deposition of n = 5 layer Bi 6 Ti 3 Fe 2 O 15 thin films using liquid injection chemical vapour deposition (LI-CVD). This is a pulsed liquid injection technique in which the volume and injection rate of precursor is controlled electronically in microliter (µL) and pulse per milliseconds (pulse/msec).…”
Section: Introductionmentioning
confidence: 99%
“…PLD has previously proven effective at depositing high order Aurivillius and Ruddlesden-Popper structures with large out-of-plane lattice parameters from a single target. [16][17][18] The plasma arriving at the substrate will be homogeneous in composition, so the growth of such lms requires the reorganisation of atoms in the out-ofplane direction on the scale of the unit cells of these materials, which can equal several nanometres. Since the growth rate in PLD is typically on the order of 1 nm per minute, this reorganisation must occur aer condensation of the plasma on the substrate, happening behind the growth front, and driven by an energetically favourable long range order.…”
Section: Introductionmentioning
confidence: 99%