Synthesis of transparent and hard SiOC(−H) thin films on polycarbonate substrates by PECVD method

Noborisaka, Mayui; Kodama, Hideyuki; Nagashima, So; Shirakura, Akira; Horiuchi, Takahiro; Suzuki, Tetsuya

doi:10.1016/j.surfcoat.2011.11.017

Cited by 22 publications

(15 citation statements)

References 25 publications

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“…The tubes were located along one wall of the chamber and were semi-enclosed to form the plasma zone, with oxygen and pre-treatment gases fed directly into this region. The total volume of the plasma glow was $9 700 cm 3 . The monomer vapor, to enable deposition, was fed separately through a gas ring aimed directly at the substrates, which were located facing the tubes.…”

Section: Deposition Conditions and Sample Handlingmentioning

confidence: 99%

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Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Hall

Murphy

Griesser

2014

Plasma Processes & Polymers

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Coatings deposited by microwave plasma enhanced CVD have potential for applications as protective coatings against mechanical and environmental damage. The properties of plasma polymer coatings can, however, vary markedly with deposition conditions, and we report here that this is also the case for coatings deposited from mixtures of tetramethyldisiloxane (TMDSO) and oxygen. Hardness, modulus, stress, mass, and surface chemical compositions all varied considerably with the TMDSO/O 2 ratio. Post-plasma reactions led to changes in the physical properties of coatings, which were found to be dependent on the oxygen concentration at the time of deposition. Coatings deposited at low oxygen concentration lost mass, became more rigid, became less tensile in stress, and underwent a large increase in hardness and modulus. These coatings were found to craze over periods of up to six months. Coatings deposited at high oxygen concentrations were observed to gain mass, became less rigid, and showed reduced compressive stress. They were more stable but their mechanical mismatch with polymer substrates affects their performance as protective coatings.

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Section: Deposition Conditions and Sample Handlingmentioning

confidence: 99%

“…Protective coatings have been made with silane based systems, [1][2][3] but these precursors are hazardous and require special handling. [4] A popular alternative is a siloxane based precursor.…”

Section: Introductionmentioning

confidence: 99%

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Hall

Murphy

Griesser

2014

Plasma Processes & Polymers

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“…• ) [6,30,31]. The network structure associates a quartz-like structure as SiO 2 and that angle is 140…”

Section: B Chemical Structure Of the Sioc(-h) Filmsmentioning

confidence: 99%

“…SiOC(-H) films have attracted much attention in various industrial fields such as dielectrics in semiconductor technology or mechanical application or food packaging because of prominent properties including hardness [2], low-k [3], electronic applications [4], gas barrier properties [5] and optical transparency [6]. In recent research, silica based films which have led to improvements in the properties noted above, have also been studied for potential applications as coatings on polymeric materials.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of SiOC(–H) Films by the Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Method

Mori

Masuko

Shirakura

et al. 2015

e-J. Surf. Sci. Nanotech.

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Synthesis of SiOC(-H) films outside generation regions using afterglow plasma under atmospheric pressure have been gaining attention because it allows deposition to complex configuration substrates with large area. We synthesized SiOC(-H) films at different oxygen gas flow rates and substrate temperatures by the atmospheric pressure plasma enhanced chemical vapor deposition method from TrMS/O2/He gases. Substrates were placed at a working distance of 10 mm between discharge electrode and substrate surface. Plasma emission is gradually weakened with an increase in oxygen gas flow rate, and excessive introduction of oxygen into the process caused the plasma to disappear. The SiOC(-H) films were composed of a number of particles; Their large size particles lead to an increasing deposition rate and the non-dense structure of the films. As the oxygen gas flow rate increased, the particle size was larger at 100 nm and related -OH peaks strongly observed. Carbon content of SiOC(-H) films decreased from 17% to only 1.8% with an increase in substrate temperature at 140• C. In this paper, we report the characterization of SiOC(-H) films synthesized under atmospheric pressure PECVD method.

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“…Well known precursors for organic coatings are, for example, silanes like hexamethyldisiloxane (HMDSO) (Schwarz et al ., 1998) or tetramethylsilane (TMS) (Noborisaka et al ., 2012). While oxygen is present, silicon dioxidelike fi lms can be produced with these compounds.…”

confidence: 99%

Organic optical coatings

Neubert

Vergöhl

2013

Optical Thin Films and Coatings

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Synthesis of transparent and hard SiOC(−H) thin films on polycarbonate substrates by PECVD method

Cited by 22 publications

References 25 publications

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Synthesis of SiOC(–H) Films by the Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Method

Organic optical coatings

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