This work introduces
photoactivated molecular layer deposition
(pMLD) as a route to deposit organic nanoscale polymer films with
molecular-level control. Surface-tethered acrylate polymers are obtained
through a radical step-growth polymerization where a diene and a diiodo
monomer, ethylene glycol dimethacrylate (EGM) and 1,3-diiodopropane
(DIP), respectively, are sequentially dosed in the vapor-phase under
pulsed UV irradiation. pMLD occurs with a constant growth rate of
3.7 Å/cycle, and both monomers display self-limiting saturation.
Films deposited by pMLD exhibit excellent stability in organic solvents.
Furthermore, annealing studies with in situ X-ray photoelectron spectroscopy
(XPS) reveals thermal stability up to 350 °C in vacuum. The mechanism
behind pMLD of EGM and DIP is proposed based on detailed characterization
of the polymer films by XPS and Fourier transform infrared spectroscopy,
growth modeling, and comparison with control studies of pMLD involving
monofunctional precursors. The coupling chemistry of pMLD presented
herein provides future possibilities to create apolar linkages in
the formation of nanoscale organic films.