The novel polymerizable b-ketophosphonic acids 4, 8, 10, and 16 as well as the 9-(methacryloyloxy)-nonylphosphonic acid 20 were synthesized in four to eight steps. They were characterized by 1 H NMR, 13 C NMR, and 31 P NMR spectroscopy and by high-resolution mass spectra. The free-radical polymerization of 4, 8, 10, and 16 was carried out in a water/ ethanol solution, using 2,2 0 -azo(2-methylpropionamidine)dihydrochloride as initiator. To evaluate the reactivity of the acidic monomers 4, 8, 10, 16, and 20, their photopolymerization behavior was investigated by photo-differential scanning calorimeter. Copolymerizations with 2-hydroxyethyl methacrylate, glycol dimethacrylate, and N,N 0 -diethyl-1,3-bis-(acrylamido)propane were studied. The homopolymerization of the corresponding b-ketophosphonates and their copolymerization with hydroxyethyl methacrylate were also carried out. Self-etch adhesives based on the b-ketophosphonic acids 4, 8, 10, and 16 were able to provide high shear bond strengths (SBSs) of dimethacrylate-based composite to dentin and enamel. The b-ketophosphonic acid 8 was also shown to exhibit significantly better adhesive properties than the corresponding phosphonic acid 20. Indeed, the presence of the carbonyl moiety in the b-position of the phosphonic acid group led to a strong improvement of the composite SBS to dentin and enamel.