“…For example, modern photoresist materials are, in general, formulated in organic solvents, developed in strong alkaline aqueous solutions, and used for the production of circuit boards, flat panel displays, television screens and semiconductor devices [1,2]. In recent years, the development of water-based photoresist has gained more and more attention [3,4,5,6]. The advantage of this system is that it can simplify the imaging process while being more environmentally desirable.…”