Corrosion is one
of the problems that most industries face. Our
aim in the current study is to perform density functional theory calculations
and Monte Carlo simulation to theoretically investigate the corrosion
inhibition of the copper (1 1 1) surface by tetrazole molecules and
a group of their derivatives. These compounds have electron-donating
groups (CH3, CH3O, and OH) and electron-withdrawing
groups (F, CN, and NO2). Two different isomeric forms of
tetrazole molecules and their derivatives, including 1H and 2H tautomers, were studied in two configurations,
parallel and perpendicular to the Cu (1 1 1) surface. With the help
of DMol3 calculations, the most important parameters related to the
molecular ability of tetrazole derivatives as corrosion inhibitors
include the adsorption energy (ΔE), E
HOMO, E
LUMO, E
gap, and issues related to chemical reactions,
including total hardness (η), electronegativity (χ), and
electron fraction transitions from the anti-corrosion molecule to
the copper atom (ΔN), were calculated and compared
in the tetrazole molecules and their derivatives. Also, with the help
of adsorption locator calculations, the inhibitory effects of these
compounds were theoretically investigated in an acidic environment.
Through these calculations, it was determined that tetrazole molecules
with electron-donating groups adsorbed perpendicularly to the copper
(1 1 1) surface, by forming a stronger bond, are considered suitable
corrosion inhibitors. Also, among the examined molecules, the 2H-tetrazole isomer form plays a more influential role than
the 1H-tetrazole form.