Synthesis TiO₂-Ag thin film by DC Sputtering method for dye degradation

Abstract

Titanium dioxide (T1O2) is well known as the most active and stable semiconductor as an environmentally friendly photocatalytic material to degrade pollutants in aqueous and gas. In this research, TiO2 thin film was synthesized on a stainless steel surface using DC sputtering method. To enhance the photocatalytic activity, the TiO2 thin film was doped with a silver (Ag) also using DC sputtering method. The surface morphology, chemical composition, and crystal structure of the thin film were characterized using scanning electron microscopy –energy dispersive spectroscopy (SEM-EDX) and X-rays diffraction (XRD), respectively. Based on SEM-EDX analysis, it’s found that the content of silver (Ag) is 10.5 % weight or 2.56 % at.. This condition was achieved for 2 minutes of deposition time. The photocatalytic activity of TiO2 and TiO2-Ag thin film was studied using UV light and sunlight. As a model pollutant, it’s used methylene blue. It’s found that, if the film exposure using UV light, the absorbance for TiO2 film is 35.85 % and 64.26 % for TiO2-Ag thin film. If the film exposure using sunlight, the absorbance for TiO2 film is 17.5 % and 76.74 % for TiO2-Ag thin film. It can be concluded that the effect of Ag doping can enhance the photocatalytic activity of the thin film.

The Effect of the Dc-Sputtering Process on Changes in the Hardness Value and Elements Composition of Biocompatible Stainless Steel 316l Material

“…The color which tends to be lighter is assumed to be the TiO2 coating, and the color which tends to be darker is assumed to be 316L stainless steel material. There is a difference in the thickness of the TiO2 layer in the sample, which is probably due to the inhomogeneity of the substrate surface during the preparation process [14] and the influence of parameters such as temperature differences at each substrate surface point. Since DC sputtering machines cannot control temperature, the temperature at any point on the substrate surface cannot be known.…”

“…This method detects X-rays produced by the interaction of an electron beam and a sample. This method can be obtained by mapping the distribution of chemical elements in the material [14]. Figure 7 shows the SEM-EDX micrograph on a cross-section of 316L stainless steel material after the DC sputtering process with a deposition time of 90 minutes.…”

“…The content of Ti and O deposited elements are 0.07% and 2.62% by weight respectively, which comes from the DC sputtering process. In the spectrum, other elements, such as C, Si, Cr, Fe, and Ni, are the constituent elements of 316L stainless steel [14]. The C content has increased compared to before the DC sputtering process, possibly due to the vacuum environment during the deposition process [28].…”

“…Sputtering is the most commonly used method in the PVD process, and one of the sputtering methods is Direct Current (DC) sputtering [13]. This method is good for synthesizing thin films on a substrate by breaking the bonds between atoms on the target so that the atoms will arrange on the substrate and form a new thin layer [14]. DC sputtering is suitable for conductive targets [15].…”