2009
DOI: 10.1109/tnano.2009.2013620
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Synthesis, Transfer, and Devices of Single- and Few-Layer Graphene by Chemical Vapor Deposition

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Cited by 256 publications
(191 citation statements)
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“…Because the various physicochemical properties of graphene are sensitive to its thickness [3][4][5] , the capability of synthesizing uniform graphene with well-controlled layer numbers has been one of the major challenges in graphene research 6 . Chemical vapour deposition (CVD) has been actively investigated since 2009 for growing graphene on catalytic metal films or foils from gaseous carbon sources at high temperatures [7][8][9][10] . The first CVD graphene was obtained on polycrystalline nickel (Ni) film, which has a small lattice mismatch with graphene 7 .…”
mentioning
confidence: 99%
“…Because the various physicochemical properties of graphene are sensitive to its thickness [3][4][5] , the capability of synthesizing uniform graphene with well-controlled layer numbers has been one of the major challenges in graphene research 6 . Chemical vapour deposition (CVD) has been actively investigated since 2009 for growing graphene on catalytic metal films or foils from gaseous carbon sources at high temperatures [7][8][9][10] . The first CVD graphene was obtained on polycrystalline nickel (Ni) film, which has a small lattice mismatch with graphene 7 .…”
mentioning
confidence: 99%
“…Recently, chemical vapor deposition ͑CVD͒ has been demonstrated as an attractive method to synthesize graphene. [10][11][12][13] The precise control over the number of graphene layers is, however, difficult due to its sensitivity to various process parameters. In this regard, CVD scheme on Cu films has been shown to result in controlled synthesis of single-layer graphene.…”
mentioning
confidence: 99%
“…15 From the Raman spectrum, a ratio of D to G peaks, I D / I G ϳ 0.09 with the 2D full width half maximum of ϳ51 cm −1 are observed, indicating a multilayer graphene sheet with relatively low defect density, similar to the previously reported graphene sheets grown by CVD on Ni substrates. [10][11][12][13] The process mechanism is similar to that of the metalinduced crystallization of inorganic semiconductors which has been widely explored in the past. 16,17 Briefly, in our case, carbon atoms diffuse into the metal layer at elevated temperatures followed by their precipitation as graphene on the free surface during the cool-down step as the solid solubility limit is reached.…”
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confidence: 99%
“…1, parameters of the prepared graphene films of measured I2D/IG and I D /I G ratios are shown in dependence on the conditions of their preparation, mainly on the thickness of the Co layer. The table is completed with a column showing the estimated number of carbon monolayers within the graphene film [3]. The best graphene films exhibit the quality of bi-layer graphene (BLG).…”
Section: Resultsmentioning
confidence: 99%
“…One of the frequently used methods for graphene preparation is CVD (chemical vapour deposition), [3]. The said method is used for preparation of graphene layers onto thin metallic foils, mainly on copper.…”
Section: Introductionmentioning
confidence: 99%