“…The multilayered GMI [Ti(6 nm)/Fe 19 Ni 81 (50 nm)] 6 /Ti(6 nm)/Cu(500nm)/Ti(6 nm)/[Fe 19 Ni 81 (50 nm)Ti(6 nm)] 6 elements were deposited by magnetron sputtering onto Corning glass (Corning Incorporated, Corning, NY, USA) substrates, using a background pressure of 3.0 × 10 −7 mbar and Ar working pressure of 3.8 × 10 −3 mbar [13,30]. Fe 19 Ni 81 composition for the magnetic layers was selected taking into account the fact that it insures the lowest magnetostriction, coercivity and high dynamic magnetic permeability [23,31,35,[39][40][41][42].…”