2019
DOI: 10.1016/j.jallcom.2018.08.119
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Tailoring strain and lattice relaxation characteristics in InGaAs/GaAsP multiple quantum wells structure with phosphorus doping engineering

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Cited by 9 publications
(3 citation statements)
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“…When imaged in the MWIR/SWIR band, several line features can be observed that are absent for the NIR/vis imaging. They likely correspond to step flow stripes caused by the accumulation of strain …”
Section: Resultsmentioning
confidence: 99%
“…When imaged in the MWIR/SWIR band, several line features can be observed that are absent for the NIR/vis imaging. They likely correspond to step flow stripes caused by the accumulation of strain …”
Section: Resultsmentioning
confidence: 99%
“…Tensile strain GaAsP barrier layers were employed to compen sate for the compressive strain in the InGaAs QW layer, and then the defect density wa reduced. The average strain is defined as [7] InGaAs InGaAs GaAs GaAs InGaAs GaAs ( ) / ( )…”
Section: Methodsmentioning
confidence: 99%
“…Choi et al found that a reduction in the growth temperature yielded highly strained epitaxial layers with decent optical properties presumably owing to the reduced formation and propagation of dislocations [6]. Hou et al studied the influence of different compositions of phosphorus in the barrier layer on the production of a high quality and smooth heterointerface of InGaAs/GaAsP QWs [7]. Dong et al investigated the influence of growth temperature on interfacial quality of InGaAs/GaAsP multiple quantum wells [8].…”
Section: Introductionmentioning
confidence: 99%