“…So far, assisted by the physics of chiral Q-BIC and the single-port critical coupling, the chiral perfect absorber with tunable spin selectivity is successfully realized. The established planar microfabrication techniques, [76][77][78] such as the electron beam lithography companied by the processes of deposition, patterning, lift-off, and etching, are competent for the construction of such planar silicon metasurface. The robustness of the chiral perfect absorptance is also investigated via changing the structural parameters including W 1 , L 1 , H, and a.…”