2021
DOI: 10.1021/acs.nanolett.1c03790
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Tailoring Third-Harmonic Diffraction Efficiency by Hybrid Modes in High-Q Metasurfaces

Abstract: Metasurfaces are versatile tools for manipulating light; however, they have received little attention as devices for the efficient control of nonlinearly diffracted light. Here, we demonstrate nonlinear wavefront control through third-harmonic generation (THG) beaming into diffraction orders with efficiency tuned by excitation of hybrid Mie–quasi-bound states in the continuum (BIC) modes in a silicon metasurface. Simultaneous excitation of the high-Q collective Mie-type modes and quasi-BIC modes leads to their… Show more

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Cited by 33 publications
(12 citation statements)
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“…So far, assisted by the physics of chiral Q-BIC and the single-port critical coupling, the chiral perfect absorber with tunable spin selectivity is successfully realized. The established planar microfabrication techniques, [76][77][78] such as the electron beam lithography companied by the processes of deposition, patterning, lift-off, and etching, are competent for the construction of such planar silicon metasurface. The robustness of the chiral perfect absorptance is also investigated via changing the structural parameters including W 1 , L 1 , H, and a.…”
Section: Simulation and Discussionmentioning
confidence: 99%
“…So far, assisted by the physics of chiral Q-BIC and the single-port critical coupling, the chiral perfect absorber with tunable spin selectivity is successfully realized. The established planar microfabrication techniques, [76][77][78] such as the electron beam lithography companied by the processes of deposition, patterning, lift-off, and etching, are competent for the construction of such planar silicon metasurface. The robustness of the chiral perfect absorptance is also investigated via changing the structural parameters including W 1 , L 1 , H, and a.…”
Section: Simulation and Discussionmentioning
confidence: 99%
“…The entire process is performed on a 220 nm-thick Si layer on a 3 µm-thick SiO buried oxide layer ( Figure 1 a). The first step is the definition of the mesa structure by electron beam lithography and reactive ion etching ( Figure 1 b) [ 22 , 23 ]. Next, dopants are introduced by ion implantation and activated through a rapid thermal annealing process ( Figure 1 c).…”
Section: Materials and Methodsmentioning
confidence: 99%
“…graphene plasmons with a very short propagation wavelength can help avoid this, if so desired 74 .) Thus, the diffraction efficiency/directionality of the emitted THG wave can be controlled, e.g., by engineering the hybridization between Mie and qBIC modes as recently demonstrated 66 . In particular, by switching the angle of incidence of the pump laser beam the distribution of the THG wave among the various diffraction orders is significantly modified, as shown in Fig.…”
Section: Non-linear Applicationsmentioning
confidence: 99%
“…, by engineering the hybridization between Mie and qBIC modes as recently demonstrated. 66 In particular, by switching the angle of incidence of the pump laser beam the distribution of the THG wave among the various diffraction orders is significantly modified, as shown in Fig. 2(a).…”
Section: Bound States In the Continuum In All-dielectric Metasurfacesmentioning
confidence: 99%