2007
DOI: 10.1038/nnano.2006.142
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Technology and metrology of new electronic materials and devices

Abstract: Scaling of the metal oxide semiconductor (MOS) field-effect transistor has been the basis of the semiconductor industry for nearly 30 years. Traditional materials have been pushed to their limits, which means that entirely new materials (such as high-kappa gate dielectrics and metal gate electrodes), and new device structures are required. These materials and structures will probably allow MOS devices to remain competitive for at least another ten years. Beyond this timeframe, entirely new device structures (s… Show more

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Cited by 181 publications
(81 citation statements)
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“…These methods offer exceptional sensitivity in characterizing the atomic composition and structure of clean substrates and in turn have been critical to developing materials and processes in semiconductor fabricationin part for their high sensitivity in measuring the densities of impurities and dopants-and to understanding the mechanisms of heterogeneous catalytic processes. 5,6 An excellent survey of these methods is provided in the text by Adamson and Gast. 7 Included is x-ray photoelectron spectroscopy where a monoenergetic x-ray source is used to eject inner shell electrons that are then analyzed to quantitatively identify the composition of elements comprising a surface.…”
Section: Analytical Methods In Surface Sciencementioning
confidence: 99%
“…These methods offer exceptional sensitivity in characterizing the atomic composition and structure of clean substrates and in turn have been critical to developing materials and processes in semiconductor fabricationin part for their high sensitivity in measuring the densities of impurities and dopants-and to understanding the mechanisms of heterogeneous catalytic processes. 5,6 An excellent survey of these methods is provided in the text by Adamson and Gast. 7 Included is x-ray photoelectron spectroscopy where a monoenergetic x-ray source is used to eject inner shell electrons that are then analyzed to quantitatively identify the composition of elements comprising a surface.…”
Section: Analytical Methods In Surface Sciencementioning
confidence: 99%
“…The better stability, higher signal-to-noise ratio, and lower background offered by the new generation aberration-corrected electron microscope is expected to further reduce the statistical errors in HAADF intensity measurements. For the characterization of the 3D morphology of nanoparticles, STEM electron tomography is a very powerful technique and has been successfully employed for embedded and stable nanoparticles [31]. The main limitation of the technique is the time required to take full tomographs.…”
mentioning
confidence: 99%
“…In case of DRAM, as an alternative technology with relaxed scaling constraints, capacitor-less one-transistor (1T) DRAM cells have been investigated by several research groups [2,3]. Impact ionization or gate induced drain leakage generates excess majority carriers in floating body, which switches the channel conductance of metal-oxide-semiconductor field effect transistor (MOSFET) from a low conductance state to a high conductance state [2,3].…”
Section: Introductionmentioning
confidence: 99%
“…in vertical device architecture [3], which provides larger scale integration at the same technology node. Vertical integration of memory cells is also important in recent flash memory development [4], where the effective unite cell size can be reduced below 4F 2 by three dimensional stacked integration.…”
Section: Introductionmentioning
confidence: 99%
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