Technology of gallium arsenide

Notes on the Chemical Polishing of Gallium Arsenide Surfaces

“…Most of the commonly used etches contain either nitric acid or hydrogen peroxide as an oxidant for the arsenic. For polishing, HF or HC1 is generally added, with or without extra water (1)(2)(3)(4)(5). Strong oxidizing agents act on arsenides to form a soluble arsenic acid, rather than an insoluble oxide as in the case of antimonides.…”

Polarization Capacitance Determinations of Surface Roughness

“…8o --0 = Rt [3] where (8~ is the initial temperature, and R is the rate at which temperature is falling with time.…”

“…Inserting [3] and [4] into [2] and integrating Integrating [8] by parts, we have e-y K(y) --+ Ei(--y) [9] y~ where Ei{--y} is the well-known exponential integral function. (See the Handbook of Chemistry and Physics for tables).…”

The Chemical Polishing of Gallium Arsenide in Bromine-Methanol

“…One of the best chemical polishes available for gallium arsenide was reported by Cunnel, Edmond, and Harding (5). This polish is quite good for all of the common faces except the {111} on which it leaves a rough finish.…”

“…References to an exhaustive survey on the thermal expansion measurements of refractory materials have been given by Wachtman, Scuderi, and Cleek (1). Linear coefficients of thermal expansion have been determined for carbides from room temperatures to high temperatures (2)(3)(4)(5), but there are no reported lattice parameter measurements at liquid nitrogen temperatures. This note deals with determinations of linear coefficients of thermal expansion for TiC, ZrC, and HfC based on measurements at 26~ and--190 ~ __.…”