2021
DOI: 10.1016/j.jssc.2021.122448
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Tellurium vacancy in two-dimensional Si2Te3 for resistive random-access memory

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Cited by 3 publications
(2 citation statements)
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“…There are several studies that propose the mechanism of resistive switching for Si 2 Te 3 memristors. Based on conventional oxide memristors, Xian et al have inferred that the formation and diffusion of tellurium vacancies are key processes in the resistive switching of Si 2 Te 3 . On the other hand, Wu et al suggested that the local phase transition associated with the external bias is responsible for the resistive switching of Si 2 Te 3 .…”
Section: Introductionmentioning
confidence: 99%
“…There are several studies that propose the mechanism of resistive switching for Si 2 Te 3 memristors. Based on conventional oxide memristors, Xian et al have inferred that the formation and diffusion of tellurium vacancies are key processes in the resistive switching of Si 2 Te 3 . On the other hand, Wu et al suggested that the local phase transition associated with the external bias is responsible for the resistive switching of Si 2 Te 3 .…”
Section: Introductionmentioning
confidence: 99%
“…This suggests a separate mechanism for the switching behavior of the thin films and explains why this low SET voltage is not observed in the nanowires. Several mechanisms exist for the resistive switching in silicon telluride including phase change 88 , and tellurium vacancy mobility 89 . The precise mechanisms surrounding the low SET voltage and large LRS:HRS ratio seen in Si2Te3 thin film devices require further exploration.…”
Section: Challenges Of Lithography Techniquesmentioning
confidence: 99%