2012 International Conference on Emerging Electronics 2012
DOI: 10.1109/icemelec.2012.6636238
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Temperature and stress dependent properties of barrier type anodic Al<inf>2</inf>O<inf>3</inf> MIM capacitor

Abstract: This paper presents a high-k barrier type anodic AI 2 03 Metal-Insulator-Metal (MIM) capacitor for mixed signalJRF applications. The anodic oxide MIM capacitor shows high capacitance density of 6.01fFJllm 2 and low voltage coefficient of capacitance less than 500ppmlV. Due to reduced defect density and improved polarization, the capacitor exhibits variability of less than 6% in the frequency range of 1KHz to IMHz at 3V. The fabricated capacitor also shows a high breakdown field of 8.7MV/cm. The measured leakag… Show more

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Cited by 2 publications
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“…In the present work, the device current change is about 20 nA/°C, whereas in the said work, it is about 0.088 nA/°C. Similarly, the effect of thin alumina dielectric layer on the temperature response is lower than that of the h-BTNC layer …”
Section: Resultsmentioning
confidence: 97%
“…In the present work, the device current change is about 20 nA/°C, whereas in the said work, it is about 0.088 nA/°C. Similarly, the effect of thin alumina dielectric layer on the temperature response is lower than that of the h-BTNC layer …”
Section: Resultsmentioning
confidence: 97%
“…The capacitance exhibits very good stability in terms of frequency (close to 3% variation in the frequency range between 10 3 and 10 6 Hz). This value is better than previous reports in the literature using anodic alumina as the dielectric [7], [9], [11]. The variation of the value of the capacitance in terms of frequency is attributed to charge traps with different time constants in the dielectric layer and at the interface with the electrodes [7].…”
Section: Resultsmentioning
confidence: 34%