Abstract:The RCA cleaning method is the industry standard way for cleaning silicon wafers, and the temperature control is important for a stable cleaning performance. However, the difficulty lies in the fact that the RCA solutions cause nonlinear and time-varying exothermic chemical reactions. So far, the MSPC (model switching predictive controller) using the CAN2 (competitive associative net 2) has been developed and the effectiveness has been validated. However, we have observed that the control performance, such as … Show more
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