2015
DOI: 10.1088/0256-307x/32/4/047801
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Temperature Dependence of Raman Scattering in 4H-SiC Films under Different Growth Conditions

Abstract: The microRaman scattering of 4H-SiC films, fabricated by low pressure chemical vapor deposition under different growth conditions, is investigated at temperatures ranging from 80 K to 550 K. The effects of growth conditions on E2(TO), E1(TO) and A1(LO) phonon mode frequencies are negligible. The temperature dependences of phonon linewidth and lifetime of E2(TO) modes are analyzed in terms of an anharmonic damping effect induced by thermal and growth conditions. The results show that the lifetime of E2(TO) mode… Show more

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Cited by 4 publications
(2 citation statements)
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“…Additionally, annealing the substrates prior to CVD leads to increased nucleation and alignment. At high temperatures, SiC(0001) undergoes a range of surface reconstructions that depend on temperature, pressure, and environmental composition. Figure c shows a SEM image of a SiC sample that was annealed at 1000 °C under Ar prior to growing the MoO 2 /MoS 2 nanoplates, resulting in ∼3× more plates on the surface. This increase in nucleation indicates that substrate surface chemistry is playing an influential role in particle nucleation.…”
mentioning
confidence: 99%
“…Additionally, annealing the substrates prior to CVD leads to increased nucleation and alignment. At high temperatures, SiC(0001) undergoes a range of surface reconstructions that depend on temperature, pressure, and environmental composition. Figure c shows a SEM image of a SiC sample that was annealed at 1000 °C under Ar prior to growing the MoO 2 /MoS 2 nanoplates, resulting in ∼3× more plates on the surface. This increase in nucleation indicates that substrate surface chemistry is playing an influential role in particle nucleation.…”
mentioning
confidence: 99%
“…The Raman spectra of the 6H-SiC films with a mean size of 1.25 μm and four different thicknesses are displayed in Figure 3 a, in which two Raman spectra of the 6H-SiC films with a mean size of 0.55 μm and thicknesses of 1.5 and 3.6 μm are shown for comparison. With regard to the 0.5 μm thick SiC film, the peaks at 795.5, 786.5, and 765.0 cm −1 are assigned to the FTO modes at x = 0, 1/3, and 1 ( Figure 3 b) [ 27 , 28 , 29 ]. There is a new peak at 776.0 cm −1 between the x = 1/3 and 1 FTO modes, which can be assigned to the x = 2/3 FTO mode.…”
Section: Resultsmentioning
confidence: 99%