2009
DOI: 10.1063/1.3139286
|View full text |Cite
|
Sign up to set email alerts
|

Temperature dependent carrier lifetime studies on Ti-doped multicrystalline silicon

Abstract: Carrier lifetime measurements were performed on deliberately Ti-doped multicrystalline silicon wafers using a temperature controlled photoconductance device. The dominant recombination center was found to be the double-donor level associated with interstitial titanium. The interstitial Ti concentrations in multicrystalline silicon wafers were determined by measuring the Shockley-Read-Hall time constant for holes and using the known values of the thermal velocity and capture cross section for holes of the doubl… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

2
11
0

Year Published

2011
2011
2021
2021

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 35 publications
(13 citation statements)
references
References 21 publications
2
11
0
Order By: Relevance
“…In the case of Cr, α is about 6%, which is reasonable considering that the diffusivity is 3 times smaller and the solubility is 1 order of magnitude smaller, in comparison to iron. In the case of titanium, we assume that the dominant recombination occurs through the double‐donor defect energy‐level as proposed by Paudyal et al29 This is reasonable due to the similarity between the samples investigated there and in this study (e.g., multicrystalline ingot prepared by intentional addition of Ti in the silicon melt). Using the electron‐capture cross section measured by Paudyal, α is as large as 90%.…”
Section: Modellingsupporting
confidence: 66%
See 1 more Smart Citation
“…In the case of Cr, α is about 6%, which is reasonable considering that the diffusivity is 3 times smaller and the solubility is 1 order of magnitude smaller, in comparison to iron. In the case of titanium, we assume that the dominant recombination occurs through the double‐donor defect energy‐level as proposed by Paudyal et al29 This is reasonable due to the similarity between the samples investigated there and in this study (e.g., multicrystalline ingot prepared by intentional addition of Ti in the silicon melt). Using the electron‐capture cross section measured by Paudyal, α is as large as 90%.…”
Section: Modellingsupporting
confidence: 66%
“…However, to the extent of its validity (e.g., at lower concentrations), the estimation of α can give an indication of the impurity electrical activity. In Table 3, the values of σ n 28–30 used to calculate α are reported. It is evident that α is as low as 0.1% for Fe.…”
Section: Modellingmentioning
confidence: 99%
“…Lifetime spectroscopy usually refers to injection‐dependent lifetime spectroscopy, i.e., IDLS, if performed at room temperature or temperature‐ and injection‐dependent lifetime spectroscopy, i.e., TIDLS, when the measurements are performed across a range of temperatures it proves the most effective in accurately determining the fundamental defect parameters such as its energy level in the band gap E t , the capture cross section ratio k ( σ n / σ p ), and the T ‐dependence of σ p and σ n . However, most of the reported studies make use of intentionally contaminated samples which means that, although extremely important to expand the general understanding about metal impurities impact on Si material, they rely on the a priori knowledge of the impurity identity introduced into the samples, and oftentimes its concentration.…”
Section: Introductionmentioning
confidence: 99%
“…18 This method is known as the temperature-and injection-dependent lifetime spectroscopy (TIDLS). 18,20 By plotting the DPSS curves at different temperatures together, the exact defect parameters should be identified by the intersections of the DPSS curves, if E t and k are assumed to be independent of temperature. 18 Recently, a customized TIDLS system has been developed in our laboratory.…”
mentioning
confidence: 99%